摘要
脉冲激光沉积薄膜是近年来发展起来的使用范围最广,最有希望的制膜技术.该文阐述了脉冲激光沉积技术的机理、特点,薄膜生长主要包括三个过程:1)激光与物质相互作用产生等离子体;2)等离子体向基片扩散;3)等离子体中粒子在基片上生长薄膜.文章还分析了脉冲沉积过程中各主要沉积参数,如激光能量密度、沉积气压和衬底情况等对薄膜质量的影响,并介绍了其在制备半导体、高温超导、类金刚石、生物陶瓷薄膜等方面的应用.
Pulsed laser deposition is the most widely-used and promising deposition technique for the growth of thin films developed in the recent years. In this paper, we have elaborated the mechanism and characteristics of pulsed laser deposition technique,the growth process of film includes:1) Plasma generation caused by light-material interaction;2) Plasma expansion towards substrate;3) Plasma recondensation on the substrate and growing thin films. Influence of the main deposition parameters such as energy density , deposition pressure and conditions of the substrate on the quality of thin films are investigated. We also have introduced its application in preparing semiconductor, high Tc superconductor, diomand and bioceramic thin films.
出处
《江西师范大学学报（自然科学版）》
CAS
北大核心
2005年第1期53-57,共5页
Journal of Jiangxi Normal University(Natural Science Edition)
