摘要
简要介绍了表面放电型 ACPDP制作工艺中电极、障壁和荧光粉的厚膜光刻技术 。
The thick film photolithography technologies for the fabrication of the electrode, barrier rib and phosphor in the surface discharge ACPDP are introduced. Some of the technology problems are discussed.
出处
《光电子技术》
CAS
2001年第1期39-44,共6页
Optoelectronic Technology
关键词
厚膜
光刻工艺
等离子体显示器
电极
PDP, thick film, photolithography, photosensitive paste
