摘要
本文描述了正在兴起的一门新学科——真空微电子学——的发展概况,它的工作原理,微型真空三极管的构造及集成加工技术。详细给出了薄膜场致发射阴极的制造过程,讨论了这类器件的应用领域及需进一步研究的问题。
This paper describes a new field-vacuum microelectronics or vacuum integrated circuits (VIC). Its principle, the structure of the field emission microtriodes and microfabri-cation technipues and processing are given in detail. The processing for the thin film field emission cathodes is also reviewed. The application of VIC and the related problems for its future development are discussed.
出处
《电子学报》
EI
CAS
CSCD
北大核心
1991年第3期89-96,共8页
Acta Electronica Sinica
