期刊文献+

掺氮对纳米金刚石薄膜形貌及组成结构的影响 被引量:4

Effect of N-doped on Surface Morphology,Microstructure and Constitutes of Nano Diamond Thin Films
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摘要 采用微波等离子体化学气相沉积技术,通过在甲烷和氢气的混合反应气源中通入不同浓度的氮气,合成了氮掺杂的纳米金刚石薄膜。表征结果表明随着氮气浓度的增加,所得到的金刚石薄膜的材料特征发生了明显的改变:膜层晶粒结构由从未见过的大尺寸片状向团簇状再向微颗粒状转变,并且薄膜的表面粗糙度相应变小;同时薄膜中非金刚石组份逐渐增多,膜材的物相纯度下降。氮气浓度除决定了纳米金刚石薄膜中N的掺杂度外,还会对膜材的物相组成、形貌及结构产生巨大的影响。 By the addition of N2 with different concentration into gas resource, N doping nano diamond films were synthesized with microwave plasma chemical vapor deposition (MPCVD) technology. The results showed that with the increasing of nitrogen concentration, the grain structure varied from flake to agglomerate and finally to fine granule, while the surface rough- ness lowered correspondingly; as for the phase constitutes of these films, the non-diamond components became more and more which as a result to decreasing the phase purity of diamond dramatically. From the research it was clear that the addition of N2 could distinctly influence the surface morphology, microstructure and phase constitutes of nano diamond thin films apart from N doping level.
出处 《武汉理工大学学报》 EI CAS CSCD 北大核心 2008年第8期11-13,37,共4页 Journal of Wuhan University of Technology
基金 国家863计划强辐射重点实验室基金(20070202) 中物院重大基金(2005z0805)
关键词 纳米金刚石薄膜 微波等离子体 化学气相沉积 nano diamond thin films microwave plasma chemical vapor deposition
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参考文献10

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