摘要
通过选择合适的研磨剂、抛光垫以及抛光材料,采用机械抛光与CMP抛光相结合的方法对应用于高激光损伤阈值的薄膜基体材料YCOB晶体进行表面加工。通过优化研磨抛光工艺后得到超光滑晶体表面,样品表面在125μm×94μm的范围内粗糙度RMS值达到0.6 nm,同时具有非常低的亚表面损伤层,经过超声清洗和有机溶剂刻蚀后,在高倍显微镜下无明显划痕。
The crystal YCOB was machined to ultra-precision statue after lapping and polishing in order to obtain high laser damage threshold.The methods of mechanic polishing and chemical mechanic polishing(CMP) were chosen to achieve this aim.The abrasive of grinding,pad and solution of polishing are picked over to find the best polishing process.Surface damage is no longer visible after CMP polishing,the surface roughness of YCOB was about 0.6 nm in the range of 125 μm × 94 μm tested by Veeco contourgraph.Beyond that,the crystal has very low sub-surface damage.There is no any scratch on subsurface that can be watched using Leica high-power microscope after corrosion by organic solvent and cleaning by ultrasonic.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2013年第6期1026-1030,1034,共6页
Journal of Synthetic Crystals
