摘要
研究的是ULSI镶嵌钨CMP的选择性 ,化学与机械作用匹配 ,浆料的悬浮及存放和后清洗等问题。
The selectivity, the chemical and mechanical function's matching, the storage of the slurry and post CMP cleaning ULSI inlaid tungsten CMP have been studied in this article.
基金
国家自然科学重大基金资助项目!( 698762 60 )
关键词
ULSI
化学机械抛光
钨
集成电路
ULSI CMP
Global planarization
Post CMP cleaning
Tungsten
