摘要
通过单因素实验研究了直流电镀和脉冲电镀的工艺参数对镀铬层粗糙度的影响。采用直流电镀,pH值较低时镀层粗糙度增大较明显,镀层粗糙度随电流密度的增大而增大,基体粗糙度对镀层粗糙度也具有较大的影响。采用脉冲电镀,占空比、频率、平均电流密度对镀层粗糙度有较大的影响;当占空比为40%,频率为80Hz时,镀层粗糙度的增大最显著。镀铬层的微观形貌呈半球凸起状;在脉冲条件下,镀层表面的凸起数量更多、形状和大小更均匀。
The influence of technological parameters of DC plating and pulse plating on the roughness of chromium coating was investigated through single factor experiment. In DC plating, the roughness remarkably increases when pH value is low, which increases with the increasing of direct current density, and the roughness of the substrate also has a bigger effect on the coating roughness. Pulse frequency, duty ratio and average current density all have a greater impact on the coating roughness in pulse electrodeposition. The increase of the coating roughness is the most significant when duty ratio is 40 % and frequency 80 Hz. The micro-morphology of the chromium coating assumes a hemispherical tumor shape. The chromium coating obtained by pulse electrodeposition has more such tumors, which are more uniform in shape and size.
出处
《电镀与环保》
CAS
CSCD
北大核心
2013年第1期17-20,共4页
Electroplating & Pollution Control
基金
中央高校基本科研业务费专项资金(HIT.NSRIF.2009154)
关键词
三价铬镀铬
直流电镀
脉冲电镀
工艺参数
粗糙度
trivalent chromium plating
DC plating
pulse plating
technological parameter
roughness
