摘要
本文对近几年来等离子体原子发射光谱 ( ICP-AES)和等离子体质谱 ( ICP-MS)在新型陶瓷材料分析中的应用进行了评述 ,讨论了应用 ICP-AES/MS技术测定陶瓷材料中痕量杂质的各种进样技术。引用文献 60篇。
A review on the analysis of advanced ceramic materials by ICP AES/MS were presented. The sample introduction techniques of ICP AES/MS in the determination of trace impurities in advanced ceramic materials were also discussed. 60 references are cited.
出处
《分析科学学报》
CAS
CSCD
2000年第1期69-75,共7页
Journal of Analytical Science
