摘要
研究了应用射频磁控溅射法在不同基板上制备ＹＳＺ薄膜和工艺条件对其微观结构的影响。结果表明，在清洁的基板上制备的ＹＳＺ 薄膜经６００ ℃以上热处理后，薄膜表面致密均匀，无裂纹，薄膜与基板的结合紧密。薄膜具有较高的电导率，完全可以作为固体电解质使用。
The method of fabricating YSZ thin film on several substrates by using RF magnetron sputtering and the effect of process conditions on the microstructure have been studied.The results indicate that the film surface is smooth,crackfree and the combination between film and clean substrate is tight after they are treated at more than 600℃ for 2h.The conductivity of sputtered YSZ thin film is high and would be a good solid electrolyte for using in high temperature electrochemistry.
出处
《功能材料》
EI
CAS
CSCD
北大核心
1999年第6期641-643,共3页
Journal of Functional Materials
基金
国家自然科学基金!资助项目(No.59582004)
关键词
射频磁控溅射法
YSZ薄膜
制备
性能
RF magnetron sputtering method
YSZ thin film
preparation
