摘要
软X射线波段滤光膜材料大都为自支撑金属薄膜,实验室环境下自支撑薄膜长期与空气接触表面易氧化,空气中的杂质原子进入自支撑薄膜内部,致使自支撑膜光学性能大幅下降.5 nm至20 nm软X射线波段Zr具有较低的质量吸收系数和较小的密度,在该波段Zr滤光膜透过率较高.采用脱模剂法制备自支撑Zr膜,在洁净的浮法玻璃上蒸镀一层NaCl做为脱膜剂,直流磁控溅射沉积Zr膜,脱膜后的到自支撑Zr膜.为防止薄膜表面氧化及空气中杂质原子进入薄膜内部,在Zr膜两面各直流磁控溅射沉积一层10 nm厚的C或Si膜作为保护膜,得到C/Zr/C、Si/Zr/Si复合膜,测试结果显示C或Si膜的引入对于自支撑Zr膜光学性能基本无影响.
Filters for soft x ray are mostly self supported metal thin films. Under experimental circumstance, while long exposure to the air of the self supported metal thin film, impurity atoms will enter into self-supported thin film, which will result in decline of self-supported thin film＇s optics performance. Zr filters have high transmittance at band from 5 nm to 20 nm because of its low mass absorption coefficient and density. After vapor depositing NaCl film on cleaned float glass as a release agent, Zr film was sputtered on NaCl film. Self-supported Zr film wass prepared after NaCl film being dissolved in deionized water. To prevent surface oxidizing and impurity atoms from the air entering Zr film in experimental environment, C or Si film with 10 nanometer thickness was sputtered on both Zr film sides for separating Zr from the air. Measurement result of C/Zr/C and Si/Zr/Si film shows that C or Si film has little influence on self-supported Zr film performance.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2011年第1期1-4,共4页
Acta Photonica Sinica
基金
国家自然科学基金(No.60977028)
上海市基础重点研究课题(No.09JC1413800)资助
关键词
自支撑薄膜
软X射线
脱模剂
磁控溅射
同步辐射
Self-supported thin film
Extreme Ultra Violet（EUV）
Release agent
Magnetron sputtering
Synchrotron radiation
