摘要
18．2nm正人射显微成像系统用多层膜可极大地提高18．2nm的反射率，但它对紫外、可见和红外光也产生很高的反射。显微成像系统用的激光等离子体光源会在红外到敦X射线产生大量的辐射，18．2nm正入射显微系统用的胶片对所有光谱都十分敏感。因此，182nm正人射显微成像系统需要用滤光片滤除不需要的光辐射并对18．2nm的软X射线有较大的透射比，这样才能获得18．2nm的软X射线像。本文讨论了18．2nm正入射显微成像系统用滤光片的设计、制作及其特性。为了去除滤光片膜中的应力，用交替蒸镀Al和C多层膜的方法来制备法光片，铝和碳膜是用磁控溅射法制备的。针孔透过率和成像实验表明，所制备的滤光片满足了18．2nm正入射显微成像系统对滤光片的要求，并且为进一步制备其他薄膜滤光片打下了基础。
The multllayer mirrors used in the normal-incidence optical system are efficient reflectors forsoft X-ray radiation. However,these same mirrors are also excellent reflectors in the visible, ultraviolet andfar-ultraviolet part of the spectrum. Forthermore,the sources used in the microscopic system emits a lot of radiation in the ultraviolet and visible part of the spectrum,and the soft X-ray film is very sensitive to these part of the spectrum. For these reasons the normal incidence microscopic system requires the filters that block ultraviolet,visible and infrared light and have good soft X-ray transmission. This paper discusses issues concerning the design,manufacture and per formance of the 18. 2 nm microscopic system. In order to reduce stress in the film,we used a Al and C multilayer approach for filters. Al and C films are evaporated by magnetron sputtering. The pinhole transmission and imaging experiments suggest that the filters are very useful for the normal-incidence 18. 2 nm microscopic system. The manufacture method of filter provides the basis for fabricating other thin foil filters.
出处
《真空科学与技术》
CSCD
北大核心
1997年第1期12-18,共7页
Vacuum Science and Technology
基金
国家自然科学基金
关键词
滤光片
显微成像系统
软X射线
Filter, Microscopic imaging system,Soft X-ray
