摘要
采用微波等离子镀膜机制备镍薄膜。该方法的特点是用纯金属镍为靶,用微波产生等离子体,用交流电源作为轰击电源,远程输运。使用XRD、SEM、EDS对采用微波等离子法沉积的薄膜进行表征,对实验结果进行分析,并对镀膜工艺进行了初步探索。
Polycrystalline nickel film was grown by microwave plasma vapor deposition（MWPVD）.In this technique,pure nickel was used as target and microwave was used to generate plasma,with AC power as bombardment power.The film was characterized by XRD,SEM and EDS.Experimental results were analyzed and summarized,and deposition process was investigated.
出处
《微电子学》
CAS
CSCD
北大核心
2010年第4期604-606,620,共4页
Microelectronics
基金
青岛市信息产业局资助项目(A-2009-06)
