摘要
介绍用直流平面磁控溅射方法制备掺铝的氧化锌透明导电薄膜并研究了其特性，阐述了金属氧化物透明导电薄膜研究的发展情况及其应用前景，并讨论了氧化锌掺铝薄膜的优点。介绍了ZnO∶Al薄膜的制备情况：靶的制备及薄膜的制备过程。测量了薄膜的光电特性，包括透射比、折射率、消光系数、方块电阻、电阻率、载流子浓度和迁移率等参数，并分析了各种实验条件对薄膜性能的影响。
Aluminum doped zincum oxide transparent conducting films were grown by dc magnetron sputtering.The film growth technique and the ZnO∶Al target fabrication were discussed.The electrical and optical properties were stud-ied, including transmittance, refractive index, extinction coefficient, sheet resistance, resistivity, carrier concentrations and mobility. And the research and application prospects of metallic oxide transparent conducting films were reviewed also.
出处
《真空科学与技术》
CSCD
北大核心
1998年第2期125-129,共5页
Vacuum Science and Technology
关键词
掺铝
氧化锌
薄膜
反应磁控溅射
透明
导电
ZnO:Al film, Reactive evaporation, Reactive magnetron sputtering
