摘要
分绍了０．８～１μｍ分步重复投影光刻机投影光刻物镜双远心成象原理及设计研制。所研制的ｇ线１／５精缩投影光刻物镜，其数值孔径ＮＡ＝０．４５，视场１５ｍｍ×１５ｍｍ，畸变不超过±０．１μｍ。
The design and development of 0.8μm projection lithographic objective with bi telecentric imaging principle for wafer stepper are introduced in the paper.The developed g line 5 fold reduction projection objective has a number aperture NA =0.45 and a field of view of 15mm×15mm,its distortion is not more than ±0.1 μm.
出处
《光电工程》
CAS
CSCD
1998年第3期52-55,共4页
Opto-Electronic Engineering
基金
国家"八五"科技攻关项目
关键词
投影物镜
紫外光刻
分步重复光刻机
光刻机
Projection objectives,Ultraviolet lithography,Step and repeat photoetching machines.
