摘要
采用微波等离子体化学气相沉积(MPCVD)方法在铜衬底上沉积了微米和纳米两种金刚石薄膜,过渡层均为钛-铝-钼。用场发射扫描电子显微镜(FESEM)观察薄膜的表面及断面形貌,用拉曼(Raman)光谱测量所得金刚石薄膜的质量,利用压痕法测试了所得薄膜的附着性能,研究结果表明:过渡层可有效提高微米金刚石薄膜在铜衬底上的附着力,反应气氛中Ar的存在可促使纳米金刚石薄膜的形成,改善薄膜表面的粗糙度。
Micro/nano diamond films were prepared by microwave plasma chemical vapor deposition（MPCVD） on Cu substrate with Ti-Al-Mo as an interlayer.The surface and cross-section morphologies were observed by FESEM, and Raman spectroscopy was used to analyze the as-deposited diamond films. The adhesion between substrate and as-deposited film was examined by way of indentation, and the results showed that the Ti-Al-Mo interlayer can enhance the adhesion effectively. In addition, the Ar gas in reaction atomosphere can accelerate the formation of nanofilms, thus improving the film surface roughness.
出处
《真空》
CAS
北大核心
2009年第6期43-46,共4页
Vacuum
基金
国家自然科学基金项目(No.50702051)
河南省科技项关项目(No.0624250014)
郑州大学校内教育基金项目
