摘要
叙述了近几年国内外的研究进展,包括高反膜几种不同的制备工艺,如电子束蒸发沉积、离子束辅助沉积、离子束溅射沉积和溶胶-凝胶沉积法等,分析了各种制备方法及工艺的特点;针对高反膜的抗激光损伤阈值低从而影响激光器输出功率的问题,讨论了提高损伤阈值的途径;最后归纳了各种制备工艺的优缺点,并探讨了进一步提高薄膜反射率的可能性。
The recent research advances of domestic and foreign countries are reviewed. It has narrated several kinds of fabrication technologies for laser high reflectance coating, such as electron beam evaporation, ion-beam-assisted deposition, ion beam sputtering deposition, sol-gel sedimentation, and so on. It also has analyzed the characteristics of each method. For the low value of anti-laser damage threshold may lead to the low output of laser, the approach to increase the value has been discussed. Finally, the advantages and disadvantages of each technology have been summarized, and the probabilities of further increasing the reflectance of thin film have been discussed.
出处
《真空电子技术》
2009年第3期30-36,共7页
Vacuum Electronics
关键词
高反膜
反射率
制备工艺
损伤阈值
High reflectance coating
The index of reflection
Craft of manufacture
Damage threshold value
