摘要
通过自动极图衍射测量与极图分析研究空心阴极离子镀TiN膜晶粒取向,结果表明,TiN膜存在(111)织构,(111)晶面平行于沉积表面,研究了负偏压对TiN晶粒取向的影响,负偏压在0～200V范围内变化不改变织构类型与取向。
The grain direction of TiN coating by hollow calhod discharge ion plating is studied by means of measuring diffraction of auto-polcfiguro and analyzing polefigure.The result shows the e/xistance of texture in TiN coating and the parallel between the (Ⅲ) and the deposited surface.The influence of negative bias on TiN grain's direction is also investigated.The negative bias within the range of 0~200 volt won't change the type and direction of the texture.
出处
《北京工业大学学报》
CAS
CSCD
1989年第2期69-73,共5页
Journal of Beijing University of Technology
