摘要
随着纳米科技的迅速发展,下一代光刻技术在微细加工领域发挥着日益重要的作用。作为复杂半导体加工主要手段之一的电子束曝光系统,需要稳定完善的控制软件来保证其正常运行。本文介绍了电子束曝光控制系统的设计原理,并着重介绍了其对电子束曝光的全过程进行控制的强大功能。
With the quick development of nanoscience and nanotechnology, Next Generation Lithography has played more and more important role in the field of micro-fabrication. As one of the complicated semiconductor machining equipments, electron heam lithography system needs steady control software system to ensure that it can run correctly. In this paper, the fundamental theories of the newly developed control system for electron beam lithography are introduced. Furthermore, the robust control of the whole process from creating exposure files until the final exposure is discussed in particular.
出处
《微计算机信息》
2009年第4期16-17,221,共3页
Control & Automation
基金
中国科学院知识创新工程重大项目资助(KGCXI-Y-8)
关键词
电子束曝光
控制系统
绘制图形
Electron beam Lithography
Control system
Draw graphics
