摘要
开展了圆环弧类图形离散算法的研究,提出了一种以图形的曲率半径作为离散精度依据的离散算法,既保证了高的离散精度又减小了数据量,提高了数据传输效率.该算法为曝光版图中不断出现的圆环弧类图形进行精确曝光提供了保障.通过图形实例进行验证,表明此种离散方法合理,离散结果适于电子束曝光要求.
A discrete algorithm for circle and arc graphics is presented in this paper, which uses graphics curvature as the discrete precision standard. This algorithm not only ensures the high accuracy of discretization, but also it reduces the amount of required data. It provides a guarantee for circle and arc exposure by electron beam lithography. Results from the experiments show that this algorithm is suitable for the electron beam lithography.
出处
《微电子学与计算机》
CSCD
北大核心
2010年第4期201-204,共4页
Microelectronics & Computer
关键词
电子束曝光
数据格式转换
图形离散
electron beam lithography
data format transformation
graphics discrete algorithm
