摘要
本文叙述图形发生器中专门设计的控制逻辑和开发的应用软件,从而使图形发生器能借助于长城86/360微机系统和一台记忆示波器实现可变矩形电子束曝光的模拟。
This paper deals with the special control logic of a pattern generator andapplication software which have been developed in order to realize the exposuresimulation of a variably rectangular electron beam lithography system with thehelp of a GREAT WALL 86/360 microcomputer and a storage oscilloscope.
出处
《电工电能新技术》
CSCD
北大核心
1989年第4期22-29,共8页
Advanced Technology of Electrical Engineering and Energy
