摘要
用脉冲偏压电弧离子镀通过控制不同的氮流量在(100)单晶Si基片上制备了不同成分的CNx薄膜.用光学显微镜,XPS,XRD,激光Raman和Nanoindenter等方法研究了薄膜的形貌、成分、结构和性能.结果表明,薄膜表面平整致密、氮含量随着氮流量的降低而降低、结构为非晶且为类金刚石薄膜;随着氮含量从18.9%降低到5.3%(摩尔百分比,全文同),薄膜的硬度和弹性模量单调增加而且增幅较大,其中硬度从15.0 GPa成倍增加到30.0 GPa;通过氮流量的调整能够敏感地改变薄膜中的sp3键的含量,是CNx薄膜的硬度和弹性模量获得大幅度调整的本质原因.
The CNx films with different nitrogen contents were prepared on single crystal Si（100） substrate under different nitrogen flow rates by pulsed bias are ion plating. The surface morphology, composition, structure and properties of CNx films are investigated by optical microscope （OM）, X-ray photoelectron spectroscopy （XPS）, X-ray diffraction （XRD）, Raman spectra and Nanoindentation, respectively. The results show that the surface of the films is uniform, smooth and dense. The nitrogen content in the CNx films decreases with the nitrogen flow rate decreasing. The results indicate that the deposited films are amorphous and have the typical characteristic of diamond-like carbon films. As the nitrogen content decreases from 18.9% to 5.3%, the hardness and elastic modulus of the films increase monotonically to a large extent, of which the hardness increases twice from 15.0 to 30.0 GPa. The sp^3 content in the CNx films can be sensitively adjusted by controlling the nitrogen flow rate, leading to the changes of hardness and elastic modulus in large ranges.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2008年第10期6636-6642,共7页
Acta Physica Sinica
基金
国家高技术研究发展计划(863)(批准号:2006AA03Z521和2007AA03Z221)资助的课题~~
