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高性能S波段Si微波脉冲功率晶体管研制

Research and Manufacture of High Performance S-Band Si Microwave Pulsed Power Transistor
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摘要 采用等平面自对准工艺技术研制成功的一种高增益、高效率和高可靠的S波段Si微波脉冲功率晶体管,该器件在fo为3.1-3.4 GHz、Vcc=32 V、PW=500μs、D=10%条件下共基极C类工作,宽带输出功率大于50 W,增益大于7.4 dB,效率大于36%;在Vcc=36 V时,宽带输出功率大于64 W,增益大于8.5 dB,效率大于36%,抗驻波失配能力达到3∶1不烧毁,表现出了良好的微波性能和高的可靠性。 With equi-planar and self-aligned technology, a high gain, high collector efficiency and high stability S-band Si microwave pulsed power transistor was manufactured successfully. Under the conditions of 3.1 to 3.4 GHz, Vcc =32 V, 500 μs pulse width, 10% duty cycle, common base configuration and Class C operation, the performance of 50 W output power, 7.4 dB power gain and 36% collector efficiency was realized. The performance of 64 W output power, 8.5 dB power gain and 36% collector efficiency was reached at the Vcc = 36 V. 3:1 load mismatch tolerance (VSWR-T) of the device was reached. The good microwave performance and reliability of the device are represented.
出处 《半导体技术》 CAS CSCD 北大核心 2008年第6期477-479,共3页 Semiconductor Technology
关键词 等平面自对准工艺 微波脉冲功率晶体管 Si equi-planar and self-aligned technology microwave pulsed power transistor
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