期刊文献+

半导体工业硅材料加工用金刚石工具的发展 被引量:7

Progress of diamond tools for cutting silicon material in semiconductor Industry
在线阅读 下载PDF
导出
摘要 随着我国半导体工业集成电路(IC)业的快速发展,硅材料加工用金刚石工具具有巨大的潜在市场。作者简介了半导体加工中使用的各种金刚石工具:其中包括:单晶硅晶锭的裁切与整圆、晶圆线切割、倒圆磨边、磨削、CMP修整器、背面减薄与划片及其最新发展。详细介绍了各种不同类型CMP修整器及其完善与发展。建议应积极研发我国半导体工业硅材料加工用金刚石工具。 With rapid development of integrated circuit(IC) in China 's semiconductor industry,diamond tools are get ting great potential market in cutting silicon materials.Different diamond tools used in semiconductor industry are introduced and described,including tools for cutting and grinding of outside diameter of Si ingot,wafer wire sawing,wafer edge grinding,grinding and finishing,CMP(chemical mechanical polishing) pad conditioner,back thinning grinding of wafer,dicing of chips and their new progress.Different type of CMP pad conditioners are introduced in detail,and their improvement & development is described.Actively researching and developing diamond tools for cutting silicon materials in semiconductor industry is suggested by the authors.
出处 《金刚石与磨料磨具工程》 CAS 北大核心 2008年第1期73-81,共9页 Diamond & Abrasives Engineering
关键词 半导体 集成电路 精密金刚石工具 semiconductor,integrated circuit(IC),precision diamond tools
  • 相关文献

参考文献23

二级参考文献94

  • 1柳滨.用于半导体材料切割的切割设备概况[J].集成电路应用,2002(9):22-25. 被引量:3
  • 2种宝春.内圆切片机的张刀对切片的影响[J].集成电路应用,2002(9):60-62. 被引量:2
  • 3柳滨.QP—108型卧式内圆切片机[J].电子工业专用设备,1994,23(3):9-11. 被引量:1
  • 4王明权,郭强生,黄克飞.QP—509型自动卧式内圆切片机[J].电子工业专用设备,1994,23(3):12-15. 被引量:1
  • 5International Technology Roadmap for Semiconductors,2001Edition Front End Process, http://www.semi.org/.
  • 6GAULHOFER E.Wafer Thinning and Strength Enhancement to Meet Emerging Packaging Requirements. IEMT Europe(2000),April.06-07,2000.
  • 7HENDRIX M,Advantages of Wet Chemical Spin-Processing for Wafer Thinning and Packaging Applications.2000 IEEE/CPMT.
  • 8SINIAGUINE O.Atmospheric Downsream Plasma Etching of Si Wafers.IEEE/CPMT Int' 1 Electronics Manufacturing Technology Symposium 1998.
  • 9MATSUI S.An Experimental Study on the Grinding of Silicon Wafer-The Wafer Rotation Grinding Method(1^st Report).Bull.Japan Soc.of Prec.Engg,Vol.No.41988.295-300.
  • 10KOMANDURI R.,"Technology Advances in Fine Abrasives Process",Annals of CIRP Vol.46(2) 1997.

共引文献172

同被引文献57

引证文献7

二级引证文献25

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部