摘要
介绍了国内外对电磁屏蔽膜(EMI)研究的现状,比较了制备EMI膜的各种方法,指出采用磁控溅射法制备的EMI膜质量较好,并给出制备EMI膜的工艺流程。
The present studying situations of electromagnetic shielding films （EMI） abroad are introduced, and several preparing methods of EMI films are compared in the paper. It is point out that the EMI films prepared by magnetron-sputtering method have good qualities. Finally, the EMI preparing process is presented.
出处
《真空电子技术》
2007年第3期73-74,共2页
Vacuum Electronics
关键词
薄膜
电磁屏蔽
磁控溅射
Thin film
Electromagnetic shielding
Magnetron-sputtering
