摘要
类似于矩形平面溅射靶的磁场和旋转式圆柱形的靶筒组成旋转式圆柱形磁控溅射靶。与常规的圆柱形磁控溅射靶相比较，该旋转式靶提高了靶材利用率和膜厚均匀度。本文介绍了旋转式圆柱形靶的结构和磁场计算方法，给出了计算公式、数据及其特性曲线。强度适度和均匀分布的磁场，保证了溅射靶的工作性能，并为靶结构的设计提供了依据。
The revolving cylindric magnetron sputtering target has the magnetic field similar to rectangular plane sputtering target and the cylinder similar to cylindric sputtering target. This revolving target improved on the usage of target material and uniformity of film thickness comparing with conventional cylindric magnetron sputtering target. In this paper, the construction of revolving cylindric target and the calculating method of its magnetic field are described, the calculation formulas and data as well as characteristic curves are given. The working preformance of sputtering target can be assured by the proper intensity and uniform distribution of magnetic field and the design of target construction can be besed on it.
出处
《真空》
CAS
北大核心
1997年第3期5-11,共7页
Vacuum
