摘要
本文介绍了射频(Radiofrequency,RF)感应耦合等离子体(Inductivecoupleplasma,ICP)离子束源的设计研究。该射频离子束源可工作于Ar,在使用四栅引出系统时,可获得100—1000eV的离子束。当射频功率为900W,在Ar为工作气体时,束流可达到600mA。在束流为120mA时,距源26cm处,在主轴方向27cm的范围内不均匀性小于±6%。该离子束源可作为大面积离子束刻蚀、离子束抛光等的离子束源。
A radio frequency ion beam source with a 10cm×30cm rectangular cross-section beam is developed and tested. This source is designed to provide large cover area for ion beam etching and polishing. With a four grid extraction system, this source can operate in argon at beam energies from 100 eV to 1000 eV. When the RF power is about 900 W, beam currents can reach to 600 mA in argon. The beam current uniformity is better than ±6% along the major axis over 27 cm length at a distance 26 cm from the ion beam source.
出处
《核技术》
EI
CAS
CSCD
北大核心
2006年第10期734-737,共4页
Nuclear Techniques
基金
国家自然科学基金(10376010)资助
