摘要
为了更好地提高引出离子束的均匀性,对离子束刻蚀用矩形射频电感耦合等离子体(ICP)离子束源提出了三种线圈的设计方法,并对这三种线圈激发的电场进行了数值计算和比较。结果表明,直线段式不等距天线和并联多螺旋不等距天线线圈能够产生均匀性良好的电场,且其耦合效率高。
To obtain more uniform beam, three types of antennas of the inductively coupled plasma ion beam source applied to the etching have been designed. The electric field distributions excited by these antennas were calculated and compared. The results show that the linear non-equidistant antenna and the parallel multi-spiral antenna are capable of generating fairly uniform electric field distributions with comparatively higher coupling efficiency.
出处
《核聚变与等离子体物理》
EI
CAS
CSCD
北大核心
2007年第1期73-76,共4页
Nuclear Fusion and Plasma Physics
基金
国家自然科学基金资助项目(10376010)
关键词
离子束源
电感耦合等离子体
天线
Ion beam source
Inductively coupled plasma
Antenna
