摘要
通过引入轴向反应源转化率η(x)和径向反应源转化率η_f(ρ),分别导得了淀积速率在卧式反应器中沿轴向及径向分布的解析表达式.从中可以清楚地看出反应器几何参数以及工艺参数对淀积速率分布的影响.将其用于对多晶硅淀积的模拟,与实验结果相符很好.
Based on introducing the axial reactant conversion percentage η(x) and the radial reac-tant conversion percentages ηk(p)the analytical expressions of film thickness distribution inaxial and radial directions of a horizontal LPCVD reactor are derived.The influence of tech-nical parameters and geometrical parameters of reactor on the distribution of deposition ratecan be seen clearly.The theoretical results of Poly-silicon deposition coincide well with experi-mental ones.
