摘要
本文应用常压CVD法制备出了α-Si薄膜,它是非晶硅太阳能电池的良好材料。采用X射线衍射、扫描电镜、红外透射谱和X射线光电子能谱对α-Si薄膜的结构和性能进行了研究,并给出了α-Si薄膜的淀积理论模型。
The a-si thin film deposited by CVD at atmosphere pressure is reported. It is the good material which a-si solar cell is made from. The Structure and properties of a-si thin film are analysed by XRD,SEM,IR spectrum and XPS spectrum. The theoretical model on a- si thin film deposition is shown.
基金
国家自然科学基金
关键词
常压
CVD
淀积
非晶态
薄膜
硅
APCVD
A-st thin film
The theoretical model on deposition
