Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a ke...Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiO_(x) has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiO_(x) as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiO_(x) thin film, the key parameters affecting the optoelectronic properties of NiO_(x) thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiO_(x) and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiO_(x) technology and the possible development opportunities were concluded and discussed.展开更多
Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the el...Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology.展开更多
In the past few decades,ion engines have been widely used in deep-space propulsion and satellite station-keeping.The aim of extending the thruster lifetime is still one of the most important parts during the design st...In the past few decades,ion engines have been widely used in deep-space propulsion and satellite station-keeping.The aim of extending the thruster lifetime is still one of the most important parts during the design stage of ion engine.As one of the core components of ion engine,the grid assembly of ion optic systems may experience long-term ion sputtering in extreme electro-thermal environments,which will eventually lead to its structural and electron-backstreaming failures.In this paper,the current studies of the grid assembly erosion process are systematically analyzed from the aspects of sputtering damage process of grid materials,numerical simulations,and measurements of erosion characteristics of grid assembly.The advantages and disadvantages of various erosion prediction models are highlighted,and the key factors and processes affecting the prediction accuracy of grid assembly erosion patterns are analyzed.Three different types of experimental methods of grid assembly erosion patterns are compared.The analysis in this paper is of great importance for selecting the sputter-resistant grid materials,as well as establishing the erosion models and measurement methods to accurately determine the erosion rate and failure modes of grid assembly.Consequently,the working conditions and structure parameters of ion optic systems could be optimized based on erosion models to promote the ion engine lifetime.展开更多
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat...Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields.展开更多
Ta-doped SnO_(2)(TTO)is a suitable candidate to replace transparent conductive oxide(TCO)composed of expensive indium used for optoelectronics and silicon heterojunction solar cells fabricated below 200℃.However,TTO ...Ta-doped SnO_(2)(TTO)is a suitable candidate to replace transparent conductive oxide(TCO)composed of expensive indium used for optoelectronics and silicon heterojunction solar cells fabricated below 200℃.However,TTO films fabricated by sputtering at low temperature still demonstrate too high resistance and optical absorptance for application in industry.In this study,we investigate the influence of sputtering ambient on the optoelectrical properties of TTO films.The addition of hydrogen and oxygen to argon during sputtering leads to a large improvement in the optoelectrical properties of TTO films.The best TTO film has a low average absorptance of 1.9%and a low resistance of 3.8×10^(-3)Ω·cm with a high carrier density of 9.3×10^(19)cm^(-3)and mobility of 17.8 cm^(2)·V^(-1)·s^(-1).The micros tructural and compositional properties of TTO films were characterized using x-ray diffraction,x-ray photoelectron spectroscopy and UV-Vis spectrophotometry.A proper ratio of hydrogen to oxygen in the sputtering gas improves the crystallinity and the doping efficiency of Ta.Optical absorptance is also reduced with suppressed formation of Sn(Ⅱ)in the TTO films.Therefore,our findings exhibit remarkable potential for the industrial application of TTO as a low-cost TCO.展开更多
Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchang...Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)_(3)O_(4) grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)_(3)O_(4))exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm^(–2) and steadily operates at 100 mA cm^(–2) for 200 h with a decay of only 272μV h^(–1),which is far better than that of commercial IrO_(2) catalyst(290 mV,1090μV h^(–1)).Tetramethylammonium cation(TMA^(+))probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)_(3)O_(4) follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)_(3)O_(4) is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened ^(*)OH bonding on the(FeCoNiCrMo)_(3)O_(4) surface and a rapid deprotonation of ^(*)OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production.展开更多
The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The...The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering.展开更多
One of the primary concerns associated with ion cyclotron resonance heating(ICRH)is the enhanced impurity sputtering resulting from radio frequency(RF)sheath formation near plasma-facing components(PFCs),such as limit...One of the primary concerns associated with ion cyclotron resonance heating(ICRH)is the enhanced impurity sputtering resulting from radio frequency(RF)sheath formation near plasma-facing components(PFCs),such as limiters.Developing a sputtering model integrated with RF sheath simulations allows for a more comprehensive understanding of the kinetic behavior of incident ions and their interactions with the limiter surface.We accordingly develop an impurity sputtering model“PMSAD”,which computes the sputtering yield(amount of impurity)on the limiter surface based on incident ion characteristics and predicts the spatial distribution of impurities.The model provides a robust method for understanding and analyzing the impurity sputtering process from limiter surfaces,which is crucial for preventing ICRH surface erosion and reducing edge and core plasma contamination.展开更多
Atmospheric escape plays a critical role in shaping the long-term climate evolution of Mars.Among the various escape mechanisms,energetic neutral atoms(ENAs)generated through charge exchange between solar wind ions an...Atmospheric escape plays a critical role in shaping the long-term climate evolution of Mars.Among the various escape mechanisms,energetic neutral atoms(ENAs)generated through charge exchange between solar wind ions and exospheric neutrals serve as an important diagnostic for ion-neutral interactions and upper atmospheric loss.This study presents direct observations of hydrogen ENAs(H-ENAs)on the dayside of Mars by using the Mars Ion and Neutral Particle Analyzer(MINPA)onboard China’s Tianwen-1 orbiter.By analyzing H-ENA data during a coronal mass ejection and a stream interaction region from December 29,2021,to January 1,2022,and comparing these data with MAVEN/SWIA(Mars Atmosphere and Volatile EvolutioN/Solar Wind Ion Analyzer)solar wind measurements,we examine the temporal evolution of H-ENA flux and the associated sputtered escape of atmospheric constituents.The observed H-ENA velocity is consistent with upstream solar wind ions,and the H-ENA-to-ion intensity ratio is used to infer variations in exospheric density,revealing a delayed response to enhanced solar wind activity.Penetrating H-ENA intensities reach up to 5.3×10^(6)s^(−1) cm^(−2),with energy fluxes on the order of(0.5-8.1)×10^(−3) mW/m^(2).The estimated oxygen sputtered escape rate driven by penetrating H-ENAs ranges from 5.5×10^(23)s^(−1) to 5.2×10^(24)s^(−1),comparable to or exceeding previous estimates based on penetrating ions.The findings highlight the need for low-altitude H-ENA observations to better quantify their atmospheric interactions and refine our understanding of nonthermal escape processes at Mars.展开更多
Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to ...Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to develop the MOSs-based gas sensors for sensing isopropanol with desired performance via a simple, effective,and controllable method. Herein, we reported the preparation of the Al-doped Zn O(AZO)/WO_(3) heterostructure films by directly depositing the AZO coating onto the WO_(3) coating using a strategy of magnetron sputtering. The AZO/WO_(3) heterostructure films were constructed by numbers of irregular nanoparticles that were interconnected with each other. The AZO/WO_(3) heterostructure films-based gas sensors exhibited excellent isopropanolsensing performance with high response, promising selectivity, low detection limit, fast response rate, wide detection range, and ideal reproducibility. The promising isopropanol-sensing performance of the AZO/WO_(3) heterostructure films arises mainly from their high uniformity, unique microstructures with high surface roughness,and the construction of the heterostructure between the AZO and WO_(3) coatings. This work provides a versatile approach to prepare the MOSs-based heterostructure films for assembling the gas sensors.展开更多
The grain boundary diffusion process(GBDP) of Dy and DyAl on sintered NdFeB magnets was conducted via magnetron-sputtering deposition of Dy and DyAl films to enhance coercivity(H_(cj)),The magnetic properties,microstr...The grain boundary diffusion process(GBDP) of Dy and DyAl on sintered NdFeB magnets was conducted via magnetron-sputtering deposition of Dy and DyAl films to enhance coercivity(H_(cj)),The magnetic properties,microstructure and anti-corrosion properties of Dy-surface-alloying NdFeB magnets obtained via magnetron sputtering and thermal diffusion were evaluated.The H_(cj) of the Dy_(95)Al_(5)-NdFeB magnet increases by 32.68%,while the remanence declines slightly.Furthermore,X-ray diffraction and microstructural analysis confirm the formation of Dy-rich shells,the higher-magnetic-anisotropy field of hard(Nd_(x)Dy_(1-x))2(FeAl)_(14)B magnetic phases and an optimised grain boundary structu re,contributing to the H_(cj)enhancement of the magnet.The elemental distribution and diffusion mechanism of the magnets are also discussed.Moreover,the corrosion resistance of the Dy_(95)Al_(5)-NdFeB magnet is substantially improved by enhancing the electrochemical stability and optimising the distribution and morphology of the intergranular phases.The findings of this study are of substantial importance in the development of low-heavy rare-earth sintered NdFeB magnets.展开更多
Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), sc...Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating.展开更多
Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As...Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As the sputtering power increases from 15 to 60 W,the Co thin films transition from an amorphous to a polycrystalline state,accompanied by an increase in the intercrystal pore width.Simultaneously,the resistivity decreases from 276 to 99μΩ·cm,coercivity increases from 162 to 293 Oe,and in-plane magnetic aniso-tropy disappears.As the sputtering pressure decreases from 1.6 to 0.2 Pa,grain size significantly increases,resistivity significantly de-creases,and the coercivity significantly increases(from 67 to 280 Oe),which can be attributed to the increase in defect width.Corres-pondingly,a quantitative model for the coercivity of Co thin films was formulated.The polycrystalline films sputtered under pressures of 0.2 and 0.4 Pa exhibit significant in-plane magnetic anisotropy,which is primarily attributable to increased microstress.展开更多
Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface com...Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field.展开更多
This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,att...This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.展开更多
Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing ...Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing control algorithms. In this study we use the hierarchical clustering analysis algorithm to perform cluster analysis on 17 descriptors related to sputtering. These descriptors are divided into four fundamental groups, with representative descriptors being the mass of the incident ion, the formation energy of the incident ion, the mass of the target and the formation energy of the target. We further discuss the possible physical processes and significance involved in the classification process, including cascade collisions, energy transfer and other processes. Finally, based on the analysis of the above descriptors, several neural network models are constructed for the regression of sputtering threshold E_(th), maximum sputtering energy E_(max) and maximum sputtering yield SY_(max). In the regression model based on 267 samples, the four descriptor attributes showed higher accuracy than the 17 descriptors(R^(2) evaluation) in the same neural network structure, with the 5×5 neural network structure achieving the highest accuracy, having an R^(2) of 0.92. Additionally, simple sputtering test data also demonstrated the generalization ability of the 5×5 neural network model, the error in maximum sputtering yield being less than 5%.展开更多
The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters ...The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition.展开更多
Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputterin...Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high ion current density. The closed-field unbalanced magnetron sputtering system （CFUBMS） has been established as a versatile technique for high-rate deposition high-quality metal, alloy, and ceramic thin films. The＇key factor in the CFUBMS system is the ability to transport high ion currents to the substrate, which can enhance the formation of full dense coatings at relatively low value homologous temperature. The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes. Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface.展开更多
The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetro...The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films.展开更多
One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro per...One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro perties of nanorods are investigated.X-ray diffraction(XRD) pattern,scanning el ectron microscopy(SEM),and transmission electron microscopy(TEM) analyses show t hat the synthesized single-crystal ZnO nanorods develop like hairpins along dif ferent radials,with a hexagonal wurtzite structure.The diameters of nanorods ran ge between 30 and 60nm and lengths up to micrometers.Photoluminescence(PL) analy sis shows that,under 280nm light excitation,a strong and sharp near band-edge U V light emission band at 372nm and a relatively weak green deep-level light emi ssion band at 516nm are observed from the ZnO nanorods,which indicates excellent crystallization and optical quality of the fabricated ZnO nanorods.展开更多
基金financially supported by the Natural Science Foundation of China (62288102, 22379067, T2441002, 6220514, and 5230226)the National Key Research and Development Program of China (2023YFB4204500)+1 种基金the Jiangsu Provincial Departments of Science and Technology (BE2022023, BK20220010, and BZ2023060)the Open Project Program of Wuhan National Laboratory for Optoelectronics (2021WNLOKF003)。
文摘Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiO_(x) has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiO_(x) as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiO_(x) thin film, the key parameters affecting the optoelectronic properties of NiO_(x) thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiO_(x) and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiO_(x) technology and the possible development opportunities were concluded and discussed.
文摘Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology.
基金co-supported by the National Key R&D Program of China(No.2022YFB3403500)the National Natural Science Foundation of China(No.NSFC52202460)the China Postdoctoral Science Foundation(Nos.2021M690392,2021TQ0036,and 2023TQ0031)。
文摘In the past few decades,ion engines have been widely used in deep-space propulsion and satellite station-keeping.The aim of extending the thruster lifetime is still one of the most important parts during the design stage of ion engine.As one of the core components of ion engine,the grid assembly of ion optic systems may experience long-term ion sputtering in extreme electro-thermal environments,which will eventually lead to its structural and electron-backstreaming failures.In this paper,the current studies of the grid assembly erosion process are systematically analyzed from the aspects of sputtering damage process of grid materials,numerical simulations,and measurements of erosion characteristics of grid assembly.The advantages and disadvantages of various erosion prediction models are highlighted,and the key factors and processes affecting the prediction accuracy of grid assembly erosion patterns are analyzed.Three different types of experimental methods of grid assembly erosion patterns are compared.The analysis in this paper is of great importance for selecting the sputter-resistant grid materials,as well as establishing the erosion models and measurement methods to accurately determine the erosion rate and failure modes of grid assembly.Consequently,the working conditions and structure parameters of ion optic systems could be optimized based on erosion models to promote the ion engine lifetime.
基金funded by Open Research Fund Program of National Key Laboratory of Aerospace Chemical Power(NKLACP120241B04)National Natural Science Foundation of China Youth Science Foundation(12402450)。
文摘Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields.
基金Project supported by the Key-Area Research and Development Program of Guangdong Province,China(Grant No.2021B0101260001)the Guangdong Basic and Applied Basic Research Foundation(Grant No.2019A1515110411)。
文摘Ta-doped SnO_(2)(TTO)is a suitable candidate to replace transparent conductive oxide(TCO)composed of expensive indium used for optoelectronics and silicon heterojunction solar cells fabricated below 200℃.However,TTO films fabricated by sputtering at low temperature still demonstrate too high resistance and optical absorptance for application in industry.In this study,we investigate the influence of sputtering ambient on the optoelectrical properties of TTO films.The addition of hydrogen and oxygen to argon during sputtering leads to a large improvement in the optoelectrical properties of TTO films.The best TTO film has a low average absorptance of 1.9%and a low resistance of 3.8×10^(-3)Ω·cm with a high carrier density of 9.3×10^(19)cm^(-3)and mobility of 17.8 cm^(2)·V^(-1)·s^(-1).The micros tructural and compositional properties of TTO films were characterized using x-ray diffraction,x-ray photoelectron spectroscopy and UV-Vis spectrophotometry.A proper ratio of hydrogen to oxygen in the sputtering gas improves the crystallinity and the doping efficiency of Ta.Optical absorptance is also reduced with suppressed formation of Sn(Ⅱ)in the TTO films.Therefore,our findings exhibit remarkable potential for the industrial application of TTO as a low-cost TCO.
文摘Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)_(3)O_(4) grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)_(3)O_(4))exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm^(–2) and steadily operates at 100 mA cm^(–2) for 200 h with a decay of only 272μV h^(–1),which is far better than that of commercial IrO_(2) catalyst(290 mV,1090μV h^(–1)).Tetramethylammonium cation(TMA^(+))probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)_(3)O_(4) follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)_(3)O_(4) is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened ^(*)OH bonding on the(FeCoNiCrMo)_(3)O_(4) surface and a rapid deprotonation of ^(*)OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production.
基金supported by National Natural Science Foundation of China (No.11275136)。
文摘The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering.
基金financially supported by the National MCF Energy R&D Program(Grant No.2022YFE03190100)the National Natural Science Foundation of China(Grant Nos.12422513,12105035,U21A20438)the Xiaomi Young Talents Program。
文摘One of the primary concerns associated with ion cyclotron resonance heating(ICRH)is the enhanced impurity sputtering resulting from radio frequency(RF)sheath formation near plasma-facing components(PFCs),such as limiters.Developing a sputtering model integrated with RF sheath simulations allows for a more comprehensive understanding of the kinetic behavior of incident ions and their interactions with the limiter surface.We accordingly develop an impurity sputtering model“PMSAD”,which computes the sputtering yield(amount of impurity)on the limiter surface based on incident ion characteristics and predicts the spatial distribution of impurities.The model provides a robust method for understanding and analyzing the impurity sputtering process from limiter surfaces,which is crucial for preventing ICRH surface erosion and reducing edge and core plasma contamination.
基金supported by the National Natural Science Foundation of China (Grant Nos. 42188101, 42274211, 41974170, 42374184, 42122032, and 41974196)the Chinese Academy of Sciences (Grant Nos. QYZDJSSW-JSC028, XDA15052500, XDA17010301, and XDB41000000)+3 种基金the CNSA (Grant No. D050103)the Specialized Research Fund for State Key Laboratories of Chinathe Specialized Research Fund for Laboratory of Geospace Environment of the University of Science and Technology of Chinasupported by the International Space Science Institute (ISSI) in Bern and Beijing through the ISSI/ISSI-BJ International Team Project titled “Understanding the Mars Space Environment Through Multi-Spacecraft Measurements” (ISSI Team Project No. 23-582 and ISSI-BJ Team Project No. 58)
文摘Atmospheric escape plays a critical role in shaping the long-term climate evolution of Mars.Among the various escape mechanisms,energetic neutral atoms(ENAs)generated through charge exchange between solar wind ions and exospheric neutrals serve as an important diagnostic for ion-neutral interactions and upper atmospheric loss.This study presents direct observations of hydrogen ENAs(H-ENAs)on the dayside of Mars by using the Mars Ion and Neutral Particle Analyzer(MINPA)onboard China’s Tianwen-1 orbiter.By analyzing H-ENA data during a coronal mass ejection and a stream interaction region from December 29,2021,to January 1,2022,and comparing these data with MAVEN/SWIA(Mars Atmosphere and Volatile EvolutioN/Solar Wind Ion Analyzer)solar wind measurements,we examine the temporal evolution of H-ENA flux and the associated sputtered escape of atmospheric constituents.The observed H-ENA velocity is consistent with upstream solar wind ions,and the H-ENA-to-ion intensity ratio is used to infer variations in exospheric density,revealing a delayed response to enhanced solar wind activity.Penetrating H-ENA intensities reach up to 5.3×10^(6)s^(−1) cm^(−2),with energy fluxes on the order of(0.5-8.1)×10^(−3) mW/m^(2).The estimated oxygen sputtered escape rate driven by penetrating H-ENAs ranges from 5.5×10^(23)s^(−1) to 5.2×10^(24)s^(−1),comparable to or exceeding previous estimates based on penetrating ions.The findings highlight the need for low-altitude H-ENA observations to better quantify their atmospheric interactions and refine our understanding of nonthermal escape processes at Mars.
基金financially supported by the National Natural Science Foundation of China (Nos.52172094 and 22209105)Shanghai Municipal Natural Science Foundation (No.21ZR1426700)the “Shuguang” Program of Shanghai Education Commission (No.19SG46)。
文摘Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to develop the MOSs-based gas sensors for sensing isopropanol with desired performance via a simple, effective,and controllable method. Herein, we reported the preparation of the Al-doped Zn O(AZO)/WO_(3) heterostructure films by directly depositing the AZO coating onto the WO_(3) coating using a strategy of magnetron sputtering. The AZO/WO_(3) heterostructure films were constructed by numbers of irregular nanoparticles that were interconnected with each other. The AZO/WO_(3) heterostructure films-based gas sensors exhibited excellent isopropanolsensing performance with high response, promising selectivity, low detection limit, fast response rate, wide detection range, and ideal reproducibility. The promising isopropanol-sensing performance of the AZO/WO_(3) heterostructure films arises mainly from their high uniformity, unique microstructures with high surface roughness,and the construction of the heterostructure between the AZO and WO_(3) coatings. This work provides a versatile approach to prepare the MOSs-based heterostructure films for assembling the gas sensors.
基金Project supported by the National Key Research and Development Program "Rare Earth New materials" Key Project (2022YFB3505400)the Guangxi Science and Technology Base and Talent Special Project (GuikeAD19245013)。
文摘The grain boundary diffusion process(GBDP) of Dy and DyAl on sintered NdFeB magnets was conducted via magnetron-sputtering deposition of Dy and DyAl films to enhance coercivity(H_(cj)),The magnetic properties,microstructure and anti-corrosion properties of Dy-surface-alloying NdFeB magnets obtained via magnetron sputtering and thermal diffusion were evaluated.The H_(cj) of the Dy_(95)Al_(5)-NdFeB magnet increases by 32.68%,while the remanence declines slightly.Furthermore,X-ray diffraction and microstructural analysis confirm the formation of Dy-rich shells,the higher-magnetic-anisotropy field of hard(Nd_(x)Dy_(1-x))2(FeAl)_(14)B magnetic phases and an optimised grain boundary structu re,contributing to the H_(cj)enhancement of the magnet.The elemental distribution and diffusion mechanism of the magnets are also discussed.Moreover,the corrosion resistance of the Dy_(95)Al_(5)-NdFeB magnet is substantially improved by enhancing the electrochemical stability and optimising the distribution and morphology of the intergranular phases.The findings of this study are of substantial importance in the development of low-heavy rare-earth sintered NdFeB magnets.
基金Funded by Shenzhen-Hong Kong Innovative Collaborative Research and Development Program (Nos.SGLH20181109 110802117, CityU 9240014)Innovation Project of Southwestern Institute of Physics (Nos.202001XWCXYD002, 202301XWCX003)CNNC Young Talent Program (No.2023JZYF-01)。
文摘Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating.
基金the financial support from the National Key Research and Development Program of China(No.2017YFB0305500)the State Key Laboratory of Powder Metallurgy,Central South University,Changsha,China.
文摘Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As the sputtering power increases from 15 to 60 W,the Co thin films transition from an amorphous to a polycrystalline state,accompanied by an increase in the intercrystal pore width.Simultaneously,the resistivity decreases from 276 to 99μΩ·cm,coercivity increases from 162 to 293 Oe,and in-plane magnetic aniso-tropy disappears.As the sputtering pressure decreases from 1.6 to 0.2 Pa,grain size significantly increases,resistivity significantly de-creases,and the coercivity significantly increases(from 67 to 280 Oe),which can be attributed to the increase in defect width.Corres-pondingly,a quantitative model for the coercivity of Co thin films was formulated.The polycrystalline films sputtered under pressures of 0.2 and 0.4 Pa exhibit significant in-plane magnetic anisotropy,which is primarily attributable to increased microstress.
基金Funded by the National Natural Science Foundation of China(No.52071252)the Key Research and Development Plan of Shaanxi Province Industrial Project(Nos.2021GY-208,2022GY-407,and 2021ZDLSF03-11)the China Postdoctoral Science Foundation(No.2020M683670XB)。
文摘Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field.
基金financial supports by National Natural Science Foundation of China(Nos.11975163 and 12175160)Nantong Basic Science Research-General Program(No.JC22022034)Natural Science Research Fund of Jiangsu College of Engineering and Technology(No.GYKY/2023/2)。
文摘This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers.
基金supported by the National Key Research and Development Program of China (No. 2020YFC2201101)the Shenzhen Key Laboratory of Intelligent Microsatellite Constellation (No. ZDSYS20210623091808026)Guangdong Basic and Applied Basic Research Foundation (No. 2021A1515110500)。
文摘Sputtering is a crucial technology in fields such as electric propulsion, materials processing and semiconductors. Modeling of sputtering is significant for improving thruster design and designing material processing control algorithms. In this study we use the hierarchical clustering analysis algorithm to perform cluster analysis on 17 descriptors related to sputtering. These descriptors are divided into four fundamental groups, with representative descriptors being the mass of the incident ion, the formation energy of the incident ion, the mass of the target and the formation energy of the target. We further discuss the possible physical processes and significance involved in the classification process, including cascade collisions, energy transfer and other processes. Finally, based on the analysis of the above descriptors, several neural network models are constructed for the regression of sputtering threshold E_(th), maximum sputtering energy E_(max) and maximum sputtering yield SY_(max). In the regression model based on 267 samples, the four descriptor attributes showed higher accuracy than the 17 descriptors(R^(2) evaluation) in the same neural network structure, with the 5×5 neural network structure achieving the highest accuracy, having an R^(2) of 0.92. Additionally, simple sputtering test data also demonstrated the generalization ability of the 5×5 neural network model, the error in maximum sputtering yield being less than 5%.
基金supported by the National Key R&D Program of China(No.2019YFE0123900)the National Natural Sci-ence Foundation of China(Grant No.51974069)the Special Fund for Basic Scientific Research of Central Colleges(N2125035).
文摘The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition.
文摘Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high ion current density. The closed-field unbalanced magnetron sputtering system （CFUBMS） has been established as a versatile technique for high-rate deposition high-quality metal, alloy, and ceramic thin films. The＇key factor in the CFUBMS system is the ability to transport high ion currents to the substrate, which can enhance the formation of full dense coatings at relatively low value homologous temperature. The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes. Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface.
基金supported by the National Natural Science Foundation of China (No. 50475057)the Tribology Science Fund of the State Key-laboratory of Tribology (No. Kf04.02)
文摘The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films.
文摘One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro perties of nanorods are investigated.X-ray diffraction(XRD) pattern,scanning el ectron microscopy(SEM),and transmission electron microscopy(TEM) analyses show t hat the synthesized single-crystal ZnO nanorods develop like hairpins along dif ferent radials,with a hexagonal wurtzite structure.The diameters of nanorods ran ge between 30 and 60nm and lengths up to micrometers.Photoluminescence(PL) analy sis shows that,under 280nm light excitation,a strong and sharp near band-edge U V light emission band at 372nm and a relatively weak green deep-level light emi ssion band at 516nm are observed from the ZnO nanorods,which indicates excellent crystallization and optical quality of the fabricated ZnO nanorods.
