摘要
Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiO_(x) has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiO_(x) as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiO_(x) thin film, the key parameters affecting the optoelectronic properties of NiO_(x) thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiO_(x) and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiO_(x) technology and the possible development opportunities were concluded and discussed.
基金
financially supported by the Natural Science Foundation of China (62288102, 22379067, T2441002, 6220514, and 5230226)
the National Key Research and Development Program of China (2023YFB4204500)
the Jiangsu Provincial Departments of Science and Technology (BE2022023, BK20220010, and BZ2023060)
the Open Project Program of Wuhan National Laboratory for Optoelectronics (2021WNLOKF003)。
