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Effect of Magnetron Sputtered Gas on Microstructure and Hydrogen Adsorption Performance of ZrCoRE Films
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作者 Zhou Chao Ma Zhanji +2 位作者 Li Gang Yang Lamaocao Zhang Huzhong 《稀有金属材料与工程》 北大核心 2025年第6期1451-1456,共6页
ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low ... ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low activation temperature and environmental friendliness.The films were deposited using DC magnetron sputtering with argon and krypton gases under various deposition pressures.The effects of sputtering gas type and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films were investigated.Results show that the films prepared in Ar exhibit a relatively dense structure with fewer grain boundaries.The increase in Ar pressure results in more grain boundaries and gap structures in the films.In contrast,films deposited in Kr display a higher density of grain boundaries and cluster structures,and the films have an obvious columnar crystal structure,with numerous interfaces and gaps distributed between the columnar structures,providing more paths for gas diffusion.As Kr pressure increases,the film demonstrates more pronounced continuous columnar structure growth,accompanied by deeper and wider grain boundaries.This structural configuration provides a larger specific surface area,which significantly improves the hydrogen adsorption speed and capacity.Consequently,high Ar and Kr pressures are beneficial to improve the adsorption performance. 展开更多
关键词 NEG film magnetron sputtering KRYPTON sputtering pressure hydrogen adsorption performance
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Magnetron sputtering NiO_(x) for perovskite solar cells 被引量:1
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作者 Xiangyi Shen Xinwu Ke +2 位作者 Yingdong Xia Qingxun Guo Yonghua Chen 《Journal of Semiconductors》 2025年第5期48-63,共16页
Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a ke... Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiO_(x) has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiO_(x) as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiO_(x) thin film, the key parameters affecting the optoelectronic properties of NiO_(x) thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiO_(x) and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiO_(x) technology and the possible development opportunities were concluded and discussed. 展开更多
关键词 magnetron sputtering NiO_(x) PEROVSKITE solar cells
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Magnetron sputter and phase change optimization of waferlevel GeTe films for RF switch
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作者 Shihang Liu Hanxiang Jia +2 位作者 Shuangzan Lu Changyu Hu Jun Liu 《Journal of Semiconductors》 2025年第7期108-114,共7页
With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteris... With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteristics of high frequency,high speed,and high precision,it is imperative for phase change switches to possess fast,accurate,and reliable switching capabilities.Moreover,wafer-level compositional homogeneity and resistivity uniformity during semiconductor manufacturing are crucial for ensuring the yield and reliability of RF switches.By controlling magnetron sputter of GeTe through from four key parameters(pressure,power,Ar flow,and post-annealing)and incorporating elemental proportional compensation in the target,we achieved effective modulation over GeTe uniformity.Finally,we successfully demonstrated the process integration of GeTe phase-change RF switches on 6-inch scaled wafers. 展开更多
关键词 GETE magnetron sputter phase change in-wafer uniformity RF switch
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Magnetron sputtered nickel oxide with suppressed interfacial defect states for efficient inverted perovskite solar cells
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作者 Guoqiang Ma Qin Tan +8 位作者 Zhaoning Li Jingwei Xiu Jiafeng Wang Tianle Cheng Dong He Qiang Sun Xuhang Ma Francesco Lamberti Zhubing He 《Journal of Energy Chemistry》 2025年第1期348-355,共8页
Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impa... Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impair device performance in a long-term view,even with surface molecule passivation.In this study,we developed high-quality magnetron-sputtered NiOxthin films through detailed process optimization,and compared systematically sputtered and spin-coated NiOxthin film surfaces from materials to devices.These sputtered NiOxfilms exhibit improved crystallinity,smoother surfaces,and significantly reduced Ni3+or Ni vacancies compared to their spin-coated counterparts.Consequently,the interface between the perovskite and sputtered NiOxfilm shows a substantially reduced density of defect states.Perovskite solar cells (PSCs) fabricated with our optimally sputtered NiOxfilms achieved a high power conversion efficiency (PCE) of up to 19.93%and demonstrated enhanced stability,maintaining 86.2% efficiency during 500 h of maximum power point tracking under one standard sun illumination.Moreover,with the surface modification using (4-(2,7-dibromo-9,9-dimethylacridin-10(9H)-yl)butyl)p hosphonic acid (DMAcPA),the device PCE was further promoted to 23.07%,which is the highest value reported for sputtered NiOxbased PSCs so far. 展开更多
关键词 Nickle oxide Magnetron sputter DEFECT Stability Perovskite solar cell
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All-sputtered proton-conductive fuel cells based on flashlight-sintered thin-film Y:BaZrO_(3-δ) electrolyte
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作者 Jiwon Baek Junseo Youn +6 位作者 Hyoun-Myoung Oh Jonghyuk Lee Haesu Lee Nguyen QMinh Young-Beom Kim Yoon Ho Lee Taehyun Park 《Chinese Journal of Structural Chemistry》 2025年第6期50-57,共8页
In this work,we present an innovative method for fabricating high-performance proton-conductive fuel cells(PCFCs)by combining magnetron sputtering and flashlight sintering(FLS)techniques.BaZr_(0.8)Y_(0.2)O_(3–δ)(BZY... In this work,we present an innovative method for fabricating high-performance proton-conductive fuel cells(PCFCs)by combining magnetron sputtering and flashlight sintering(FLS)techniques.BaZr_(0.8)Y_(0.2)O_(3–δ)(BZY20)electrolyte thin-films are successfully prepared by improving the crystallinity while maintaining the stoichiometry.All components of PCFC,Ni-YSZ anode,BZY20 electrolyte and Pt-GDC cathode are fabricated by sequentially sputtering them onto an AAO substrate.Electrolytic sintering is performed at 550 and 650 V conditions using FLS,effectively solving the Ba evaporation problem encountered in conventional thermal sintering methods.XRD analysis confirms that the perovskite structure is retained,and crystallinity is improved in the FLS samples.Furthermore,FE-SEM and EDS analyses confirm the uniform elemental distribution and consistent thickness of the FLS-treated electrolyte.An optimized PCFC unit cell with FLS-treated electrolyte exhibits a peak power density of 200.0 mW cm^(-2) at 500℃ and an ohmic resistance of 376.0 mΩ cm^(-2).These results suggest that the combination of magnetron sputtering and FLS techniques is a promising approach for fabricating highperformance thin-film PCFCs. 展开更多
关键词 Proton-conductive fuel cell BZY Magnetron sputtering Flashlight sintering Ba evaporation
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Solution for Environmentally Friendly Silver Surface Magnetron Sputtering Color Titanium Film Layer Technology
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作者 Huan Zhu Krisada Daoruang Chalisa Apiwathnasorn 《Journal of Environmental & Earth Sciences》 2025年第1期562-572,共11页
Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the el... Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology. 展开更多
关键词 Environmental Protection Magnetron sputtering SILVER Colored Film Titanium Film Layer
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Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures
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作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology(防务技术)》 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
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Status analysis on sputtering and erosion evaluation methods of ion optic systems
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作者 Long MIAO Tongxun YANG +3 位作者 Zhengxi ZHU Chang LU Zhiwen WU Ningfei WANG 《Chinese Journal of Aeronautics》 2025年第1期254-270,共17页
In the past few decades,ion engines have been widely used in deep-space propulsion and satellite station-keeping.The aim of extending the thruster lifetime is still one of the most important parts during the design st... In the past few decades,ion engines have been widely used in deep-space propulsion and satellite station-keeping.The aim of extending the thruster lifetime is still one of the most important parts during the design stage of ion engine.As one of the core components of ion engine,the grid assembly of ion optic systems may experience long-term ion sputtering in extreme electro-thermal environments,which will eventually lead to its structural and electron-backstreaming failures.In this paper,the current studies of the grid assembly erosion process are systematically analyzed from the aspects of sputtering damage process of grid materials,numerical simulations,and measurements of erosion characteristics of grid assembly.The advantages and disadvantages of various erosion prediction models are highlighted,and the key factors and processes affecting the prediction accuracy of grid assembly erosion patterns are analyzed.Three different types of experimental methods of grid assembly erosion patterns are compared.The analysis in this paper is of great importance for selecting the sputter-resistant grid materials,as well as establishing the erosion models and measurement methods to accurately determine the erosion rate and failure modes of grid assembly.Consequently,the working conditions and structure parameters of ion optic systems could be optimized based on erosion models to promote the ion engine lifetime. 展开更多
关键词 Electric propulsion Ion optic systems sputtering yield Erosion characteristics Erosion pattern measurement Lifetime evaluation
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Characteristics of radio-frequency magnetron sputtering with Ag target operated near the electron series resonance oscillation
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作者 Chao YE 《Plasma Science and Technology》 2025年第3期111-117,共7页
The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The... The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering. 展开更多
关键词 electron series resonance magnetron sputtering radio-frequency discharge
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Reactively-sputtered ZnSnO buffer layer optimizes energy band alignment for efficient Cd-free kesterite solar cells
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作者 Haojia Zheng Jun Zhao +8 位作者 Ping Luo Muhammad Abbas Muhammad Ishaq Shuo Chen Zhuanghao Zheng Zhenghua Su Guojie Chen Liming Ding Guangxing Liang 《Nano Research》 2025年第11期450-458,共9页
The efficiency of Cu2ZnSnS4(CZTS)solar cells is limited due to interfacial band misalignment and severe non-radiative recombination.ZnSnO(ZTO)is a promising Cd-free buffer layer,offering a potential for favorable band... The efficiency of Cu2ZnSnS4(CZTS)solar cells is limited due to interfacial band misalignment and severe non-radiative recombination.ZnSnO(ZTO)is a promising Cd-free buffer layer,offering a potential for favorable band alignment with CZTS absorber.Here,we demonstrate that optimizing the temperature-dependent deposition during reactive magnetron sputtering significantly promotes elemental interdiffusion.For the proposed CZTS/ZTO interface,a favorable“spike-like”band alignment is achieved,effectively enhancing the carrier transport efficiency and reducing the interfacial defect density.Furthermore,Zn diffusion mitigates CuZn(that is,copper atoms sit at sites normally occupied by zinc atoms)antisite defects,reducing the non-radiative recombination and improving the absorber quality.Finally,the champion device achieved the highest power conversion efficiency(PCE)of 10.90%by sputtering ZTO as buffer layer in CZTS solar cell so far,with a high open circuit voltage(VOC)of 740 mV and a fill factor(FF)of 61.79%.This strategy highlights the potential of sputtered ZTO as a scalable and eco-friendly buffer layer for Cd-free CZTS solar cells. 展开更多
关键词 Cu2ZnSnS4 ZnSnO buffer layer spike-like band alignment sputtering deposition solar cell
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Constructing high-entropy spinel oxide thin films via magnetron sputtering for efficiently electrocatalyzing alkaline oxygen evolution reaction
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作者 Yuhui Chen Congbao Guo +2 位作者 Yi Wang Kun Wang Shuqin Song 《Chinese Journal of Catalysis》 2025年第10期210-219,共10页
Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchang... Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)_(3)O_(4) grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)_(3)O_(4))exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm^(–2) and steadily operates at 100 mA cm^(–2) for 200 h with a decay of only 272μV h^(–1),which is far better than that of commercial IrO_(2) catalyst(290 mV,1090μV h^(–1)).Tetramethylammonium cation(TMA^(+))probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)_(3)O_(4) follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)_(3)O_(4) is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened ^(*)OH bonding on the(FeCoNiCrMo)_(3)O_(4) surface and a rapid deprotonation of ^(*)OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production. 展开更多
关键词 High entropy spinel oxide Magnetron sputtering Alkaline water electrolysis Oxygen evolution reaction
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Influence of sputtering ambient with hydrogen gas on optoelectrical properties of Ta-doped tin oxide
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作者 Haozhen Li Xingqian Chen +2 位作者 Minqiu Du Wei Chen Xiaolong Du 《Chinese Physics B》 2025年第7期542-548,共7页
Ta-doped SnO_(2)(TTO)is a suitable candidate to replace transparent conductive oxide(TCO)composed of expensive indium used for optoelectronics and silicon heterojunction solar cells fabricated below 200℃.However,TTO ... Ta-doped SnO_(2)(TTO)is a suitable candidate to replace transparent conductive oxide(TCO)composed of expensive indium used for optoelectronics and silicon heterojunction solar cells fabricated below 200℃.However,TTO films fabricated by sputtering at low temperature still demonstrate too high resistance and optical absorptance for application in industry.In this study,we investigate the influence of sputtering ambient on the optoelectrical properties of TTO films.The addition of hydrogen and oxygen to argon during sputtering leads to a large improvement in the optoelectrical properties of TTO films.The best TTO film has a low average absorptance of 1.9%and a low resistance of 3.8×10^(-3)Ω·cm with a high carrier density of 9.3×10^(19)cm^(-3)and mobility of 17.8 cm^(2)·V^(-1)·s^(-1).The micros tructural and compositional properties of TTO films were characterized using x-ray diffraction,x-ray photoelectron spectroscopy and UV-Vis spectrophotometry.A proper ratio of hydrogen to oxygen in the sputtering gas improves the crystallinity and the doping efficiency of Ta.Optical absorptance is also reduced with suppressed formation of Sn(Ⅱ)in the TTO films.Therefore,our findings exhibit remarkable potential for the industrial application of TTO as a low-cost TCO. 展开更多
关键词 transparent conductive oxide(TCO) magnetron sputtering AMBIENT Ta-doped SnO_(2) H_(2)
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Martian atmosphere sputtering escape generated by penetrating hydrogen energetic neutral atoms
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作者 JiJie Ma LingGao Kong +13 位作者 Hao Gu WenYa Li YuMing Wang YuTian Chi BinBin Tang XiaoPeng Liu YiFan Song BaiQu Pu FuHao Qiao LiMin Wang Jun Cui Yong Wei AiBing Zhang Chi Wang 《Earth and Planetary Physics》 2025年第6期1147-1156,共10页
Atmospheric escape plays a critical role in shaping the long-term climate evolution of Mars.Among the various escape mechanisms,energetic neutral atoms(ENAs)generated through charge exchange between solar wind ions an... Atmospheric escape plays a critical role in shaping the long-term climate evolution of Mars.Among the various escape mechanisms,energetic neutral atoms(ENAs)generated through charge exchange between solar wind ions and exospheric neutrals serve as an important diagnostic for ion-neutral interactions and upper atmospheric loss.This study presents direct observations of hydrogen ENAs(H-ENAs)on the dayside of Mars by using the Mars Ion and Neutral Particle Analyzer(MINPA)onboard China’s Tianwen-1 orbiter.By analyzing H-ENA data during a coronal mass ejection and a stream interaction region from December 29,2021,to January 1,2022,and comparing these data with MAVEN/SWIA(Mars Atmosphere and Volatile EvolutioN/Solar Wind Ion Analyzer)solar wind measurements,we examine the temporal evolution of H-ENA flux and the associated sputtered escape of atmospheric constituents.The observed H-ENA velocity is consistent with upstream solar wind ions,and the H-ENA-to-ion intensity ratio is used to infer variations in exospheric density,revealing a delayed response to enhanced solar wind activity.Penetrating H-ENA intensities reach up to 5.3×10^(6)s^(−1) cm^(−2),with energy fluxes on the order of(0.5-8.1)×10^(−3) mW/m^(2).The estimated oxygen sputtered escape rate driven by penetrating H-ENAs ranges from 5.5×10^(23)s^(−1) to 5.2×10^(24)s^(−1),comparable to or exceeding previous estimates based on penetrating ions.The findings highlight the need for low-altitude H-ENA observations to better quantify their atmospheric interactions and refine our understanding of nonthermal escape processes at Mars. 展开更多
关键词 penetrating energetic neutral atoms sputtered escape Mars atmosphere loss Tianwen-1 future energetic neutral atom observations
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Corrosion resistance of self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes Ti_(3)AlC_(2)coating deposited by magnetron sputtered on copper
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作者 WANG Guo-qing WANG Ning +5 位作者 HU Yi-teng WANG Jing GAO Chuan-hui WANG Jie XUE Jun-jie YAN Ke-xin 《Journal of Central South University》 2025年第3期867-881,共15页
Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines pla... Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes/Ti_(3)AlC_(2)coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10^(−8)A/cm^(2).Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion. 展开更多
关键词 magnetron sputtering TiO_(2)nanotubes Ti_(3)AlC_(2)coating corrosion resistance performance
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Impurity sputtering model for ICRF edge plasma-surface interactions
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作者 Quan-Zhi Zhang Ze-Xuan Liu +2 位作者 Fang-Fang Ma Lei-Yu Zhang Nosir Matyakubov 《Chinese Physics B》 2025年第3期168-175,共8页
One of the primary concerns associated with ion cyclotron resonance heating(ICRH)is the enhanced impurity sputtering resulting from radio frequency(RF)sheath formation near plasma-facing components(PFCs),such as limit... One of the primary concerns associated with ion cyclotron resonance heating(ICRH)is the enhanced impurity sputtering resulting from radio frequency(RF)sheath formation near plasma-facing components(PFCs),such as limiters.Developing a sputtering model integrated with RF sheath simulations allows for a more comprehensive understanding of the kinetic behavior of incident ions and their interactions with the limiter surface.We accordingly develop an impurity sputtering model“PMSAD”,which computes the sputtering yield(amount of impurity)on the limiter surface based on incident ion characteristics and predicts the spatial distribution of impurities.The model provides a robust method for understanding and analyzing the impurity sputtering process from limiter surfaces,which is crucial for preventing ICRH surface erosion and reducing edge and core plasma contamination. 展开更多
关键词 ion cyclotron resonance heating(ICRH) radio frequency(RF)sheath physical sputtering
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Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems 被引量:8
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作者 Jun Zhou Zhe Wu Zhanhe Liu 《Journal of University of Science and Technology Beijing》 CSCD 2008年第6期775-781,共7页
Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputterin... Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high ion current density. The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal, alloy, and ceramic thin films. The'key factor in the CFUBMS system is the ability to transport high ion currents to the substrate, which can enhance the formation of full dense coatings at relatively low value homologous temperature. The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes. Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface. 展开更多
关键词 magnetron sputtering closed-field unbalanced magnetron sputtering system (CFUBMS) ion-to-atom ratio unbalancedmagnetron sputtering
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Recent Developments in Magnetron Sputtering 被引量:2
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作者 于翔 王成彪 +2 位作者 刘阳 于德洋 邢廷炎 《Plasma Science and Technology》 SCIE EI CAS CSCD 2006年第3期337-343,共7页
The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetro... The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films. 展开更多
关键词 balanced and unbalanced magnetron sputtering mid-frequency magnetron sputtering ion assisted sputtering
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Preparation of Al-doped ZnO sputter target by hot pressing 被引量:6
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作者 王星明 白雪 +4 位作者 段华英 石志霞 孙静 卢世刚 黄松涛 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2011年第7期1550-1556,共7页
Al-doped ZnO (AZO) target was prepared by hot pressing using ZnO and Al2O3 powder in mass ratio of 98:2.The effects of hot pressing conditions including temperature,pressure and preserving time on relative density ... Al-doped ZnO (AZO) target was prepared by hot pressing using ZnO and Al2O3 powder in mass ratio of 98:2.The effects of hot pressing conditions including temperature,pressure and preserving time on relative density were investigated.Pore evolution and phase structure change during densification process were studied.The results show that AZO target with super high relative density of 99% was prepared by two-stage hot pressing method under pressure of 35MPa,temperature of 1 050℃ and 1 150℃ with preserving time of 1 h,respectively.At temperature around 1 050℃,the number of isolated pore wasminimum.At temperature lower than 900℃,there existed Al2O3 phase.At temperature higher than 1 000℃,ZnAl2O4 phase was generated and its content was increased with temperature increasing.Hot pressing method had the advantage over pressureless sintering that the content of ZnAl2O4 was lower and sintering temperature could be also lower.With increasing the hot pressing temperature and preserving time,the electric resistivity of AZO target decreased greatly.A low resistivity of 3 10-3 cm was achieved under the temperature of 1 100℃,pressure of 35MPa and preserving time of 10 h. 展开更多
关键词 aluminum-doped ZnO (AZO) sputter target hot pressing PORE phase structure
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Synthesis of One-Dimensional ZnO Na norods by Oxidating Zinc Films Deposited with Magnetron Sputtering 被引量:5
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作者 石礼伟 李玉国 +2 位作者 王强 薛成山 王书运 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第10期1211-1214,共4页
One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro per... One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro perties of nanorods are investigated.X-ray diffraction(XRD) pattern,scanning el ectron microscopy(SEM),and transmission electron microscopy(TEM) analyses show t hat the synthesized single-crystal ZnO nanorods develop like hairpins along dif ferent radials,with a hexagonal wurtzite structure.The diameters of nanorods ran ge between 30 and 60nm and lengths up to micrometers.Photoluminescence(PL) analy sis shows that,under 280nm light excitation,a strong and sharp near band-edge U V light emission band at 372nm and a relatively weak green deep-level light emi ssion band at 516nm are observed from the ZnO nanorods,which indicates excellent crystallization and optical quality of the fabricated ZnO nanorods. 展开更多
关键词 magnetron sputtering thermal oxidation ZNO nan orods properties
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Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature 被引量:3
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作者 孙宜华 王海林 +2 位作者 陈剑 方亮 王磊 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1655-1662,共8页
Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of ... Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV. 展开更多
关键词 AZO thin film microstructure optoelectronic properties RF magnetron sputtering
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