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Magnetron sputtering NiO_(x) for perovskite solar cells 被引量:1
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作者 Xiangyi Shen Xinwu Ke +2 位作者 Yingdong Xia Qingxun Guo Yonghua Chen 《Journal of Semiconductors》 2025年第5期48-63,共16页
Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a ke... Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiO_(x) has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiO_(x) as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiO_(x) thin film, the key parameters affecting the optoelectronic properties of NiO_(x) thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiO_(x) and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiO_(x) technology and the possible development opportunities were concluded and discussed. 展开更多
关键词 magnetron sputtering NiO_(x) PEROVSKITE solar cells
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Solution for Environmentally Friendly Silver Surface Magnetron Sputtering Color Titanium Film Layer Technology
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作者 Huan Zhu Krisada Daoruang Chalisa Apiwathnasorn 《Journal of Environmental & Earth Sciences》 2025年第1期562-572,共11页
Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the el... Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology. 展开更多
关键词 Environmental Protection magnetron sputtering SILVER Colored Film Titanium Film Layer
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Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures
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作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology(防务技术)》 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
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Constructing high-entropy spinel oxide thin films via magnetron sputtering for efficiently electrocatalyzing alkaline oxygen evolution reaction
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作者 Yuhui Chen Congbao Guo +2 位作者 Yi Wang Kun Wang Shuqin Song 《Chinese Journal of Catalysis》 2025年第10期210-219,共10页
Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchang... Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)_(3)O_(4) grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)_(3)O_(4))exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm^(–2) and steadily operates at 100 mA cm^(–2) for 200 h with a decay of only 272μV h^(–1),which is far better than that of commercial IrO_(2) catalyst(290 mV,1090μV h^(–1)).Tetramethylammonium cation(TMA^(+))probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)_(3)O_(4) follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)_(3)O_(4) is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened ^(*)OH bonding on the(FeCoNiCrMo)_(3)O_(4) surface and a rapid deprotonation of ^(*)OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production. 展开更多
关键词 High entropy spinel oxide magnetron sputtering Alkaline water electrolysis Oxygen evolution reaction
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Characteristics of radio-frequency magnetron sputtering with Ag target operated near the electron series resonance oscillation
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作者 Chao YE 《Plasma Science and Technology》 2025年第3期111-117,共7页
The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The... The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering. 展开更多
关键词 electron series resonance magnetron sputtering radio-frequency discharge
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Al-doped ZnO/WO_(3) heterostructure films prepared by magnetron sputtering for isopropanol sensors 被引量:3
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作者 Wei-Xiang Gao Xue-Ting Chang +5 位作者 Xiao-Jie Zhu Jun-Feng Li Ying-Chang Jiang Dong-Sheng Wang Chuan-Xiao Yang Shi-Bin Sun 《Rare Metals》 SCIE EI CAS CSCD 2024年第1期247-256,共10页
Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to ... Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to develop the MOSs-based gas sensors for sensing isopropanol with desired performance via a simple, effective,and controllable method. Herein, we reported the preparation of the Al-doped Zn O(AZO)/WO_(3) heterostructure films by directly depositing the AZO coating onto the WO_(3) coating using a strategy of magnetron sputtering. The AZO/WO_(3) heterostructure films were constructed by numbers of irregular nanoparticles that were interconnected with each other. The AZO/WO_(3) heterostructure films-based gas sensors exhibited excellent isopropanolsensing performance with high response, promising selectivity, low detection limit, fast response rate, wide detection range, and ideal reproducibility. The promising isopropanol-sensing performance of the AZO/WO_(3) heterostructure films arises mainly from their high uniformity, unique microstructures with high surface roughness,and the construction of the heterostructure between the AZO and WO_(3) coatings. This work provides a versatile approach to prepare the MOSs-based heterostructure films for assembling the gas sensors. 展开更多
关键词 Metal oxide semiconductors Gas sensors Aldoped ZnO/WO_(3) Heterostructure films ISOPROPANOL magnetron sputtering
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Improvements in properties of NdFeB magnets obtained via magnetron sputtering and thermal diffusion 被引量:2
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作者 Jin Tang Weichao Huang Dan Li 《Journal of Rare Earths》 SCIE EI CAS CSCD 2024年第9期1710-1716,I0003,共8页
The grain boundary diffusion process(GBDP) of Dy and DyAl on sintered NdFeB magnets was conducted via magnetron-sputtering deposition of Dy and DyAl films to enhance coercivity(H_(cj)),The magnetic properties,microstr... The grain boundary diffusion process(GBDP) of Dy and DyAl on sintered NdFeB magnets was conducted via magnetron-sputtering deposition of Dy and DyAl films to enhance coercivity(H_(cj)),The magnetic properties,microstructure and anti-corrosion properties of Dy-surface-alloying NdFeB magnets obtained via magnetron sputtering and thermal diffusion were evaluated.The H_(cj) of the Dy_(95)Al_(5)-NdFeB magnet increases by 32.68%,while the remanence declines slightly.Furthermore,X-ray diffraction and microstructural analysis confirm the formation of Dy-rich shells,the higher-magnetic-anisotropy field of hard(Nd_(x)Dy_(1-x))2(FeAl)_(14)B magnetic phases and an optimised grain boundary structu re,contributing to the H_(cj)enhancement of the magnet.The elemental distribution and diffusion mechanism of the magnets are also discussed.Moreover,the corrosion resistance of the Dy_(95)Al_(5)-NdFeB magnet is substantially improved by enhancing the electrochemical stability and optimising the distribution and morphology of the intergranular phases.The findings of this study are of substantial importance in the development of low-heavy rare-earth sintered NdFeB magnets. 展开更多
关键词 magnetron sputtering NDFEB Rare earths MICROSTRUCTURE Magnetic property Corrosion resistance
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Surface Metallization of Glass Fiber(GF)/Polyetheretherketone(PEEK) Composite with Cu Coatings Deposited by Magnetron Sputtering and Electroplating 被引量:1
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作者 钟利 金凡亚 +2 位作者 朱剑豪 TONG Honghui DAN Min 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第1期213-220,共8页
Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), sc... Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating. 展开更多
关键词 surface metallization Cu coating magnetron sputtering ELECTROPLATING
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Structural and magnetic properties of micropolycrystalline cobalt thin films fabricated by direct current magnetron sputtering
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作者 Kerui Song Zhou Li +2 位作者 Mei Fang Zhu Xiao Qian Lei 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2024年第2期384-394,共11页
Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As... Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As the sputtering power increases from 15 to 60 W,the Co thin films transition from an amorphous to a polycrystalline state,accompanied by an increase in the intercrystal pore width.Simultaneously,the resistivity decreases from 276 to 99μΩ·cm,coercivity increases from 162 to 293 Oe,and in-plane magnetic aniso-tropy disappears.As the sputtering pressure decreases from 1.6 to 0.2 Pa,grain size significantly increases,resistivity significantly de-creases,and the coercivity significantly increases(from 67 to 280 Oe),which can be attributed to the increase in defect width.Corres-pondingly,a quantitative model for the coercivity of Co thin films was formulated.The polycrystalline films sputtered under pressures of 0.2 and 0.4 Pa exhibit significant in-plane magnetic anisotropy,which is primarily attributable to increased microstress. 展开更多
关键词 cobalt thin film magnetron sputtering microstructure electromagnetic properties
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Preparation and Properties of Cu-Containing High-entropy Alloy Nitride Films by Magnetron Sputtering on Titanium Alloy
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作者 DENG Wanrong YANG Wei +5 位作者 YU Sen LAN Nan MA Xiqun WANG Liqun GAO Wei CHEN Jian 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第6期1586-1594,共9页
Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface com... Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field. 展开更多
关键词 titanium alloy high-entropy alloy nitride film magnetron sputtering properties
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Effects of power on ion behaviors in radio-frequency magnetron sputtering of indium tin oxide(ITO)
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作者 李茂洋 莫超超 +7 位作者 陈佳丽 季佩宇 谭海云 张潇漫 崔美丽 诸葛兰剑 吴雪梅 黄天源 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第7期116-122,共7页
This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,att... This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers. 展开更多
关键词 RF magnetron sputtering ITO film ion energy distribution functions plasma diagnosis
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Study of bias voltage effect on the performance of ta-C coating prepared by high power impulse magnetron sputtering
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作者 冯利民 何哲秋 +2 位作者 严森 李建中 石俊杰 《China Welding》 CAS 2024年第1期7-12,共6页
The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters ... The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition. 展开更多
关键词 bias voltage magnetron sputtering deposition rate wear resistance
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Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems 被引量:8
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作者 Jun Zhou Zhe Wu Zhanhe Liu 《Journal of University of Science and Technology Beijing》 CSCD 2008年第6期775-781,共7页
Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputterin... Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high ion current density. The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal, alloy, and ceramic thin films. The'key factor in the CFUBMS system is the ability to transport high ion currents to the substrate, which can enhance the formation of full dense coatings at relatively low value homologous temperature. The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes. Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface. 展开更多
关键词 magnetron sputtering closed-field unbalanced magnetron sputtering system (CFUBMS) ion-to-atom ratio unbalancedmagnetron sputtering
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Synthesis of One-Dimensional ZnO Na norods by Oxidating Zinc Films Deposited with Magnetron Sputtering 被引量:5
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作者 石礼伟 李玉国 +2 位作者 王强 薛成山 王书运 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第10期1211-1214,共4页
One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro per... One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro perties of nanorods are investigated.X-ray diffraction(XRD) pattern,scanning el ectron microscopy(SEM),and transmission electron microscopy(TEM) analyses show t hat the synthesized single-crystal ZnO nanorods develop like hairpins along dif ferent radials,with a hexagonal wurtzite structure.The diameters of nanorods ran ge between 30 and 60nm and lengths up to micrometers.Photoluminescence(PL) analy sis shows that,under 280nm light excitation,a strong and sharp near band-edge U V light emission band at 372nm and a relatively weak green deep-level light emi ssion band at 516nm are observed from the ZnO nanorods,which indicates excellent crystallization and optical quality of the fabricated ZnO nanorods. 展开更多
关键词 magnetron sputtering thermal oxidation ZNO nan orods properties
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Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature 被引量:3
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作者 孙宜华 王海林 +2 位作者 陈剑 方亮 王磊 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1655-1662,共8页
Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of ... Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV. 展开更多
关键词 AZO thin film microstructure optoelectronic properties RF magnetron sputtering
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Properties of W/DLC/W-S-C composite films fabricated by magnetron sputtering 被引量:2
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作者 代明江 韦春贝 +4 位作者 周克崧 朱敏 侯惠君 林松盛 佟鑫 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第9期3002-3011,共10页
A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of... A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of the composite films was studied in the conditions of the ambient air and N2 gas atmosphere by ball-on-disk tester.The results indicate that the composite films show dense and amorphous microstructure.The WCx and WSx compounds are found in amorphous diamond like carbon matrix in the top layers of W-S-C.A proper WSx content is beneficial for improving the adhesion of the composite films.In air atmosphere,the composite films with high C content have better wear resistance and the friction coefficients range from 0.15 to 0.25.In N2 condition,high WSx content is benefit for the wear resistance and the friction coefficients of the composite films range from 0.03 to 0.1. 展开更多
关键词 W/DLC/W-S-C composite film magnetron sputtering adhesion strength friction coefficient
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Effect of bias voltage on compositional, mechanical and corrosion property of ZrNbAlN multilayer films by unbalanced magnetron sputtering 被引量:2
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作者 石永敬 潘复生 +2 位作者 鲍明东 潘虎成 Muhammad RASHAD 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第9期2856-2863,共8页
Nano-scaled ZrNbAlN films with different negative bias voltages(Vb) were deposited on bronze substrate and Si(100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properti... Nano-scaled ZrNbAlN films with different negative bias voltages(Vb) were deposited on bronze substrate and Si(100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properties were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. It is found that mole concentrations of Zr and Nb are affected by Vb, which leads to the increase of binding energy of N 1s and Al 2p and decrease of binding energy of Zr 3d5/2 and Nb 3d5/2. Surface morphologies evolution controlled by Vb could be observed. Furthermore, X-ray diffraction patterns reveal that these films show a(111) preferred orientation. Moreover, mechanical property and corrosion behavior of ZrNbAlN films were characterized by nanoindentation test and corrosion test, respectively. A maximum value of 21.85 GPa at-70 V occurs in the ZrNbAlN- bronze system, which outperforms uncoated bronze. Corrosion experiments in 0.5 mol/L NaCl and 0.5 mol/L HCl solution show that corrosion potential and corrosion current are dependent on Vb, and better anti-corrosion property could be obtained at-90 V. 展开更多
关键词 ZrNbAlN multilayer film magnetron sputtering COMPOSITION CORROSION
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Recent Developments in Magnetron Sputtering 被引量:2
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作者 于翔 王成彪 +2 位作者 刘阳 于德洋 邢廷炎 《Plasma Science and Technology》 SCIE EI CAS CSCD 2006年第3期337-343,共7页
The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetro... The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films. 展开更多
关键词 balanced and unbalanced magnetron sputtering mid-frequency magnetron sputtering ion assisted sputtering
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Preparation of Ti_2AlC MAX Phase Coating by DC Magnetron Sputtering Deposition and Vacuum Heat Treatment 被引量:11
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作者 Zongjian Feng Peiling Ke Aiying Wang 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2015年第12期1193-1197,共5页
Due to the excellent corrosion resistance and high irradiation damage resistance,Ti 2AlC MAX phase is considered as a candidate for applications as corrosion resistant and irradiation resistant protective coating.MAX ... Due to the excellent corrosion resistance and high irradiation damage resistance,Ti 2AlC MAX phase is considered as a candidate for applications as corrosion resistant and irradiation resistant protective coating.MAX phase coatings can be fabricated through firstly depositing a coating containing the three elements M,A,and X close to stoichiometry of the MAX phases using physical vapor deposition,followed by heat treatment in vacuum.In this work,Ti-Al-C coating was prepared on austenitic stainless steels by reactive DC magnetron sputtering with a compound Ti (50)Al (50) target,and CH4 used as the reactive gas.It was found that the as-deposited coating is mainly composed of Ti 3AlC antiperovskite phase with supersaturated solid solution of Al.Additionally,the ratio of Ti/Al remained the same as that of the target composition.Nevertheless,a thicker thermally grown Ti 2AlC MAX phase coating was obtained after being annealed at 800℃ in vacuum for 1 h.Meanwhile,the ratio of Ti/Al became close to stoichiometry of Ti 2AlC MAX phases.It can be understood that owing to the higher activity of Al,it diffused quickly into the substrate during annealing,and then more stable Ti 2AlC MAX phases transformed from the Ti 3AlC antiperovskite phase. 展开更多
关键词 TI2ALC MAX phase COATING magnetron sputtering Microstructure
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Corrosion and wear resistance of AZ31 Mg alloy treated by duplex process of magnetron sputtering and plasma electrolytic oxidation 被引量:13
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作者 Bing-jian WEI Yu-lin CHENG +2 位作者 Yuan-yuan LIU Zhun-da ZHU Ying-liang CHENG 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2021年第8期2287-2306,共20页
In order to improve the wear and corrosion resistance of AZ31 magnesium alloy,a magnetron-sputtered Al layer with a thickness of 11μm was firstly applied on the alloy,and then treated by plasma electrolytic oxidation... In order to improve the wear and corrosion resistance of AZ31 magnesium alloy,a magnetron-sputtered Al layer with a thickness of 11μm was firstly applied on the alloy,and then treated by plasma electrolytic oxidation(PEO)in an aluminate and silicate electrolytes,respectively.The performance of PEO coatings was investigated by dry sliding wear and electrochemical corrosion tests.The aluminate coating exhibits excellent wear resistance under both 10 and 20 N loads.The silicate coating only shows low wear rate under 10 N,but it was destroyed under 20 N.Corrosion tests show that the Al layer after magnetron sputtering treatment alone cannot afford good protection to the Mg substrate.However,the duplex layer of PEO/Al can significantly improve the corrosion resistance of AZ31 alloy.Electrochemical tests show that the aluminate and silicate coatings have corrosion current densities of-1.6×10^(-6) and-1.1×10^(-6) A/cm^(2),respectively,which are two orders lower than that of the un-coated AZ31 alloy.However,immersion tests and electrochemical impedance spectroscopy(EIS)show that the aluminate coating exhibits better long-term corrosion protection than silicate coating. 展开更多
关键词 AZ31 magnesium alloy magnetron sputtering plasma electrolytic oxidation dry sliding wear CORROSION
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