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Magnetron sputtering NiO_(x) for perovskite solar cells 被引量:1
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作者 Xiangyi Shen Xinwu Ke +2 位作者 Yingdong Xia Qingxun Guo Yonghua Chen 《Journal of Semiconductors》 2025年第5期48-63,共16页
Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a ke... Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiO_(x) has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiO_(x) as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiO_(x) thin film, the key parameters affecting the optoelectronic properties of NiO_(x) thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiO_(x) and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiO_(x) technology and the possible development opportunities were concluded and discussed. 展开更多
关键词 magnetron sputtering NiO_(x) PEROVSKITE solar cells
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Effect of Magnetron Sputtered Gas on Microstructure and Hydrogen Adsorption Performance of ZrCoRE Films
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作者 Zhou Chao Ma Zhanji +2 位作者 Li Gang Yang Lamaocao Zhang Huzhong 《稀有金属材料与工程》 北大核心 2025年第6期1451-1456,共6页
ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low ... ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low activation temperature and environmental friendliness.The films were deposited using DC magnetron sputtering with argon and krypton gases under various deposition pressures.The effects of sputtering gas type and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films were investigated.Results show that the films prepared in Ar exhibit a relatively dense structure with fewer grain boundaries.The increase in Ar pressure results in more grain boundaries and gap structures in the films.In contrast,films deposited in Kr display a higher density of grain boundaries and cluster structures,and the films have an obvious columnar crystal structure,with numerous interfaces and gaps distributed between the columnar structures,providing more paths for gas diffusion.As Kr pressure increases,the film demonstrates more pronounced continuous columnar structure growth,accompanied by deeper and wider grain boundaries.This structural configuration provides a larger specific surface area,which significantly improves the hydrogen adsorption speed and capacity.Consequently,high Ar and Kr pressures are beneficial to improve the adsorption performance. 展开更多
关键词 NEG film magnetron sputtering KRYPTON sputtering pressure hydrogen adsorption performance
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Magnetron sputter and phase change optimization of waferlevel GeTe films for RF switch
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作者 Shihang Liu Hanxiang Jia +2 位作者 Shuangzan Lu Changyu Hu Jun Liu 《Journal of Semiconductors》 2025年第7期108-114,共7页
With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteris... With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteristics of high frequency,high speed,and high precision,it is imperative for phase change switches to possess fast,accurate,and reliable switching capabilities.Moreover,wafer-level compositional homogeneity and resistivity uniformity during semiconductor manufacturing are crucial for ensuring the yield and reliability of RF switches.By controlling magnetron sputter of GeTe through from four key parameters(pressure,power,Ar flow,and post-annealing)and incorporating elemental proportional compensation in the target,we achieved effective modulation over GeTe uniformity.Finally,we successfully demonstrated the process integration of GeTe phase-change RF switches on 6-inch scaled wafers. 展开更多
关键词 GETE magnetron sputter phase change in-wafer uniformity RF switch
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Magnetron sputtered nickel oxide with suppressed interfacial defect states for efficient inverted perovskite solar cells
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作者 Guoqiang Ma Qin Tan +8 位作者 Zhaoning Li Jingwei Xiu Jiafeng Wang Tianle Cheng Dong He Qiang Sun Xuhang Ma Francesco Lamberti Zhubing He 《Journal of Energy Chemistry》 2025年第1期348-355,共8页
Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impa... Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impair device performance in a long-term view,even with surface molecule passivation.In this study,we developed high-quality magnetron-sputtered NiOxthin films through detailed process optimization,and compared systematically sputtered and spin-coated NiOxthin film surfaces from materials to devices.These sputtered NiOxfilms exhibit improved crystallinity,smoother surfaces,and significantly reduced Ni3+or Ni vacancies compared to their spin-coated counterparts.Consequently,the interface between the perovskite and sputtered NiOxfilm shows a substantially reduced density of defect states.Perovskite solar cells (PSCs) fabricated with our optimally sputtered NiOxfilms achieved a high power conversion efficiency (PCE) of up to 19.93%and demonstrated enhanced stability,maintaining 86.2% efficiency during 500 h of maximum power point tracking under one standard sun illumination.Moreover,with the surface modification using (4-(2,7-dibromo-9,9-dimethylacridin-10(9H)-yl)butyl)p hosphonic acid (DMAcPA),the device PCE was further promoted to 23.07%,which is the highest value reported for sputtered NiOxbased PSCs so far. 展开更多
关键词 Nickle oxide magnetron sputter DEFECT Stability Perovskite solar cell
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Experimental Demonstration of Multiport Magnetron Units with Specific Power Distribution toward Phased Array Applications
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作者 Da-gui SHEN Liang-jie BI +7 位作者 Yu QIN Pan CUI Xin-yu JIANG Rui GUO Hai-long LI Bin WANG Lin MENG Yong YIN 《真空电子技术》 2025年第3期26-35,共10页
In this paper,three magnetrons with each of them having specifically designed multiple coupling ports,which deliver specific power distribution for developing a magnetron array based on efficient phase locking between... In this paper,three magnetrons with each of them having specifically designed multiple coupling ports,which deliver specific power distribution for developing a magnetron array based on efficient phase locking between them,are proposed to produce high powerμs-level pulses.To demonstrate the effectiveness of the magnetron with one and two coupling ports as a unit for efficient phase locking,we designed experimentally the coupling ports delivering~10%(the power distribution ratio)of the output power of the magnetron for coupling with other magnetron units.The effect of one and two coupling ports on the operating capability,including the power distribution ratio,anode current and frequency,is demonstrated by establishing an equivalent experimental model which can characterize an ideal operation of the array.The experimental results show that the power distribution ratio is~9%for the magnetron with one coupling port,and~12.5%(coupling port 1,2)for the magnetron with two coupling ports.This shows good uniformity of the coupling capability of the two coupling ports and provides guidance for optimizing the power distribution ratio of multiport magnetron units,which are critical for efficient phase locking in the proposed array in future and higher power arrays. 展开更多
关键词 magnetronS phased array high power phase locking vacuum electronics
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Solution for Environmentally Friendly Silver Surface Magnetron Sputtering Color Titanium Film Layer Technology
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作者 Huan Zhu Krisada Daoruang Chalisa Apiwathnasorn 《Journal of Environmental & Earth Sciences》 2025年第1期562-572,共11页
Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the el... Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology. 展开更多
关键词 Environmental Protection magnetron Sputtering SILVER Colored Film Titanium Film Layer
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Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures
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作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology(防务技术)》 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
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Characteristics of radio-frequency magnetron sputtering with Ag target operated near the electron series resonance oscillation
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作者 Chao YE 《Plasma Science and Technology》 2025年第3期111-117,共7页
The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The... The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering. 展开更多
关键词 electron series resonance magnetron sputtering radio-frequency discharge
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Constructing high-entropy spinel oxide thin films via magnetron sputtering for efficiently electrocatalyzing alkaline oxygen evolution reaction
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作者 Yuhui Chen Congbao Guo +2 位作者 Yi Wang Kun Wang Shuqin Song 《Chinese Journal of Catalysis》 2025年第10期210-219,共10页
Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchang... Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)_(3)O_(4) grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)_(3)O_(4))exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm^(–2) and steadily operates at 100 mA cm^(–2) for 200 h with a decay of only 272μV h^(–1),which is far better than that of commercial IrO_(2) catalyst(290 mV,1090μV h^(–1)).Tetramethylammonium cation(TMA^(+))probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)_(3)O_(4) follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)_(3)O_(4) is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened ^(*)OH bonding on the(FeCoNiCrMo)_(3)O_(4) surface and a rapid deprotonation of ^(*)OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production. 展开更多
关键词 High entropy spinel oxide magnetron sputtering Alkaline water electrolysis Oxygen evolution reaction
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Corrosion resistance of self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes Ti_(3)AlC_(2)coating deposited by magnetron sputtered on copper
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作者 WANG Guo-qing WANG Ning +5 位作者 HU Yi-teng WANG Jing GAO Chuan-hui WANG Jie XUE Jun-jie YAN Ke-xin 《Journal of Central South University》 2025年第3期867-881,共15页
Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines pla... Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes/Ti_(3)AlC_(2)coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10^(−8)A/cm^(2).Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion. 展开更多
关键词 magnetron sputtering TiO_(2)nanotubes Ti_(3)AlC_(2)coating corrosion resistance performance
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Al-doped ZnO/WO_(3) heterostructure films prepared by magnetron sputtering for isopropanol sensors 被引量:3
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作者 Wei-Xiang Gao Xue-Ting Chang +5 位作者 Xiao-Jie Zhu Jun-Feng Li Ying-Chang Jiang Dong-Sheng Wang Chuan-Xiao Yang Shi-Bin Sun 《Rare Metals》 SCIE EI CAS CSCD 2024年第1期247-256,共10页
Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to ... Metal oxide semiconductors(MOSs) are ideal sensing materials for detecting volatile organic compounds due to their low cost, diversity, high stability, and ease of production. However, it remains a grand challenge to develop the MOSs-based gas sensors for sensing isopropanol with desired performance via a simple, effective,and controllable method. Herein, we reported the preparation of the Al-doped Zn O(AZO)/WO_(3) heterostructure films by directly depositing the AZO coating onto the WO_(3) coating using a strategy of magnetron sputtering. The AZO/WO_(3) heterostructure films were constructed by numbers of irregular nanoparticles that were interconnected with each other. The AZO/WO_(3) heterostructure films-based gas sensors exhibited excellent isopropanolsensing performance with high response, promising selectivity, low detection limit, fast response rate, wide detection range, and ideal reproducibility. The promising isopropanol-sensing performance of the AZO/WO_(3) heterostructure films arises mainly from their high uniformity, unique microstructures with high surface roughness,and the construction of the heterostructure between the AZO and WO_(3) coatings. This work provides a versatile approach to prepare the MOSs-based heterostructure films for assembling the gas sensors. 展开更多
关键词 Metal oxide semiconductors Gas sensors Aldoped ZnO/WO_(3) Heterostructure films ISOPROPANOL magnetron sputtering
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Improvements in properties of NdFeB magnets obtained via magnetron sputtering and thermal diffusion 被引量:2
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作者 Jin Tang Weichao Huang Dan Li 《Journal of Rare Earths》 SCIE EI CAS CSCD 2024年第9期1710-1716,I0003,共8页
The grain boundary diffusion process(GBDP) of Dy and DyAl on sintered NdFeB magnets was conducted via magnetron-sputtering deposition of Dy and DyAl films to enhance coercivity(H_(cj)),The magnetic properties,microstr... The grain boundary diffusion process(GBDP) of Dy and DyAl on sintered NdFeB magnets was conducted via magnetron-sputtering deposition of Dy and DyAl films to enhance coercivity(H_(cj)),The magnetic properties,microstructure and anti-corrosion properties of Dy-surface-alloying NdFeB magnets obtained via magnetron sputtering and thermal diffusion were evaluated.The H_(cj) of the Dy_(95)Al_(5)-NdFeB magnet increases by 32.68%,while the remanence declines slightly.Furthermore,X-ray diffraction and microstructural analysis confirm the formation of Dy-rich shells,the higher-magnetic-anisotropy field of hard(Nd_(x)Dy_(1-x))2(FeAl)_(14)B magnetic phases and an optimised grain boundary structu re,contributing to the H_(cj)enhancement of the magnet.The elemental distribution and diffusion mechanism of the magnets are also discussed.Moreover,the corrosion resistance of the Dy_(95)Al_(5)-NdFeB magnet is substantially improved by enhancing the electrochemical stability and optimising the distribution and morphology of the intergranular phases.The findings of this study are of substantial importance in the development of low-heavy rare-earth sintered NdFeB magnets. 展开更多
关键词 magnetron sputtering NDFEB Rare earths MICROSTRUCTURE Magnetic property Corrosion resistance
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Surface Metallization of Glass Fiber(GF)/Polyetheretherketone(PEEK) Composite with Cu Coatings Deposited by Magnetron Sputtering and Electroplating 被引量:1
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作者 钟利 金凡亚 +2 位作者 朱剑豪 TONG Honghui DAN Min 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第1期213-220,共8页
Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), sc... Surface metallization of glass fiber(GF)/polyetheretherketone(PEEK)[GF/PEEK] is conducted by coating copper using electroplating and magnetron sputtering and the properties are determined by X-ray diffraction(XRD), scanning electron microscopy(SEM), and electron backscatter diffraction(EBSD).The coating bonding strength is assessed by pull-out tests and scribing in accordance with GB/T 9286-1998.The results show that the Cu coating with a thickness of 30 μm deposited on GF/PEEK by magnetron sputtering has lower roughness, finer grain size, higher crystallinity, as well as better macroscopic compressive stress,bonding strength, and electrical conductivity than the Cu coating deposited by electroplating. 展开更多
关键词 surface metallization Cu coating magnetron sputtering ELECTROPLATING
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Structural and magnetic properties of micropolycrystalline cobalt thin films fabricated by direct current magnetron sputtering
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作者 Kerui Song Zhou Li +2 位作者 Mei Fang Zhu Xiao Qian Lei 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2024年第2期384-394,共11页
Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As... Pure cobalt(Co)thin films were fabricated by direct current magnetron sputtering,and the effects of sputtering power and pres-sure on the microstructure and electromagnetic properties of the films were investigated.As the sputtering power increases from 15 to 60 W,the Co thin films transition from an amorphous to a polycrystalline state,accompanied by an increase in the intercrystal pore width.Simultaneously,the resistivity decreases from 276 to 99μΩ·cm,coercivity increases from 162 to 293 Oe,and in-plane magnetic aniso-tropy disappears.As the sputtering pressure decreases from 1.6 to 0.2 Pa,grain size significantly increases,resistivity significantly de-creases,and the coercivity significantly increases(from 67 to 280 Oe),which can be attributed to the increase in defect width.Corres-pondingly,a quantitative model for the coercivity of Co thin films was formulated.The polycrystalline films sputtered under pressures of 0.2 and 0.4 Pa exhibit significant in-plane magnetic anisotropy,which is primarily attributable to increased microstress. 展开更多
关键词 cobalt thin film magnetron sputtering microstructure electromagnetic properties
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Preparation and Properties of Cu-Containing High-entropy Alloy Nitride Films by Magnetron Sputtering on Titanium Alloy
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作者 DENG Wanrong YANG Wei +5 位作者 YU Sen LAN Nan MA Xiqun WANG Liqun GAO Wei CHEN Jian 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS CSCD 2024年第6期1586-1594,共9页
Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface com... Magnetron sputtering deposition with regulated Cu target power was used for depositing Cu-containing high-entropy alloy nitride(Cu-(HEA)N)films on TC4 titanium alloy substrates.The microscopic morphologies,surface compositions,and thicknesses of the films were characterized using SEM+EDS;the anti-corrosion,wear resistance and antibacterial properties of the films in simulated seawater were investigated.The experimental results show that all four Cu-(HEA)N films are uniformly dense and contained nanoparticles.The film with Cu doping come into contact with oxygen in the air to form cuprous oxide.The corrosion resistance of the(HEA)N film without Cu doping on titanium alloy is better than the films with Cu doping.The Cu-(HEA)N film with Cu target power of 16 W shows the best wear resistance and antibacterial performance,which is attributed to the fact that Cu can reduce the coefficient of friction and exacerbate corrosion,and the formation of cuprous oxide has antibacterial properties.The findings of this study provide insights for engineering applications of TC4 in the marine field. 展开更多
关键词 titanium alloy high-entropy alloy nitride film magnetron sputtering properties
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Exploring negative ion behaviors and their influence on properties of DC magnetron sputtered ITO films under varied power and pressure conditions
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作者 Maoyang Li Chaochao Mo +6 位作者 Peiyu Ji Xiaoman Zhang Jiali Chen Lanjian Zhuge Xuemei Wu Haiyun Tan Tianyuan Huang 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第10期442-449,共8页
We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of disch... We deposited indium-tin-oxide(ITO)films on silicon and quartz substrates by magnetron sputtering technology in pure argon.Using electrostatic quadrupole plasma diagnostic technology,we investigate the effects of discharge power and discharge pressure on the ion flux and energy distribution function of incidence on the substrate surface,with special attention to the production of high-energy negative oxygen ions,and elucidate the mechanism behind its production.At the same time,the structure and properties of ITO films are systematically characterized to understand the potential effects of high energy oxygen ions on the growth of ITO films.Combining with the kinetic property analysis of sputtering damage mechanism of transparent conductive oxide(TCO)thin films,this study provides valuable physical understanding of optimization of TCO thin film deposition process. 展开更多
关键词 magnetron sputtering ion energy ITO thin film high energy oxygen anion
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Effects of power on ion behaviors in radio-frequency magnetron sputtering of indium tin oxide(ITO)
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作者 李茂洋 莫超超 +7 位作者 陈佳丽 季佩宇 谭海云 张潇漫 崔美丽 诸葛兰剑 吴雪梅 黄天源 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第7期116-122,共7页
This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,att... This study delves into ion behavior at the substrate position within RF magnetron discharges utilizing an indium tin oxide(ITO)target.The positive ion energies exhibit an upward trajectory with increasing RF power,attributed to heightened plasma potential and initial emergent energy.Simultaneously,the positive ion flux escalates owing to amplified sputtering rates and electron density.Conversely,negative ions exhibit broad ion energy distribution functions(IEDFs)characterized by multiple peaks.These patterns are clarified by a combination of radiofrequency oscillation of cathode voltage and plasma potential,alongside ion transport time.This elucidation finds validation in a one-dimensional model encompassing the initial ion energy.At higher RF power,negative ions surpassing 100 e V escalate in both flux and energy,posing a potential risk of sputtering damages to ITO layers. 展开更多
关键词 RF magnetron sputtering ITO film ion energy distribution functions plasma diagnosis
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Effect of substrate temperature and oxygen plasma treatment on the properties of magnetron-sputtered CdS for solar cell applications
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作者 Runxuan Zang Haolin Wang +9 位作者 Xiaoqi Peng Ke Li Yuehao Gu Yizhe Dong Zhihao Yan Zhiyuan Cai Huihui Gao Shuwei Sheng Rongfeng Tang Tao Chen 《中国科学技术大学学报》 CAS CSCD 北大核心 2024年第6期22-33,I0010,共13页
Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films h... Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films have emerged,among which magnetron sputtering(MS)is one of the most commonly used vacuum techniques.For this type of technique,the substrate temperature is one of the key deposition parameters that affects the interfacial properties between the target film and substrate,determining the specific growth habits of the films.Herein,the effect of substrate temperature on the microstructure and electrical properties of magnetron-sputtered CdS(MS-CdS)films was studied and applied for the first time in hydrothermally deposited antimony selenosulfide(Sb_(2)(S,Se)_(3))solar cells.Adjusting the substrate temperature not only results in the design of the flat and dense film with enhanced crystallinity but also leads to the formation of an energy level arrangement with a Sb_(2)(S,Se)_(3)layer that is more favorable for electron transfer.In addition,we developed an oxygen plasma treatment for CdS,reducing the parasitic absorption of the device and resulting in an increase in the short-circuit current density of the solar cell.This study demonstrates the feasibility of MS-CdS in the fabrication of hydrothermal Sb_(2)(S,Se)_(3)solar cells and provides interface optimization strategies to improve device performance. 展开更多
关键词 magnetron sputtering CDS substrate heating plasma treatment Sb_(2)(S Se)_(3) thin film solar cell
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Study of bias voltage effect on the performance of ta-C coating prepared by high power impulse magnetron sputtering
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作者 冯利民 何哲秋 +2 位作者 严森 李建中 石俊杰 《China Welding》 CAS 2024年第1期7-12,共6页
The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters ... The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition. 展开更多
关键词 bias voltage magnetron sputtering deposition rate wear resistance
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Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems 被引量:8
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作者 Jun Zhou Zhe Wu Zhanhe Liu 《Journal of University of Science and Technology Beijing》 CSCD 2008年第6期775-781,共7页
Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputterin... Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high ion current density. The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal, alloy, and ceramic thin films. The'key factor in the CFUBMS system is the ability to transport high ion currents to the substrate, which can enhance the formation of full dense coatings at relatively low value homologous temperature. The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes. Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface. 展开更多
关键词 magnetron sputtering closed-field unbalanced magnetron sputtering system (CFUBMS) ion-to-atom ratio unbalancedmagnetron sputtering
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