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Magnetron sputtering NiO_(x) for perovskite solar cells 被引量:1
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作者 Xiangyi Shen Xinwu Ke +2 位作者 Yingdong Xia Qingxun Guo Yonghua Chen 《Journal of Semiconductors》 2025年第5期48-63,共16页
Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a ke... Perovskite solar cells(PSCs) have become a hot topic in the field of renewable energy due to their excellent power conversion efficiency and potential for low-cost manufacturing. The hole transport layer(HTL), as a key component of PSCs,plays a crucial role in the cell's overall performance. Magnetron sputtering NiO_(x) has attracted widespread attention due to its high carrier mobility, excellent stability, and suitability for large-scale production. Herein, an insightful summary of the recent progress of magnetron sputtering NiO_(x) as the HTL of PSCs is presented to promote its further development. This review summarized the basic properties of magnetron sputtering NiO_(x) thin film, the key parameters affecting the optoelectronic properties of NiO_(x) thin films during the magnetron-sputtering process, and the performance of the corresponding PSCs. Special attention was paid to the interfacial issues between NiO_(x) and perovskites, and the modification strategies were systematically summarized. Finally, the challenges of sputtering NiO_(x) technology and the possible development opportunities were concluded and discussed. 展开更多
关键词 magnetron sputtering NiO_(x) PEROVSKITE solar cells
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Effect of Magnetron Sputtered Gas on Microstructure and Hydrogen Adsorption Performance of ZrCoRE Films
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作者 Zhou Chao Ma Zhanji +2 位作者 Li Gang Yang Lamaocao Zhang Huzhong 《稀有金属材料与工程》 北大核心 2025年第6期1451-1456,共6页
ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low ... ZrCoRE(RE denotes rare earth elements)non-evaporable getter films have significant applications in vacuum packaging of micro-electro mechanical system devices because of their excellent gas adsorption performance,low activation temperature and environmental friendliness.The films were deposited using DC magnetron sputtering with argon and krypton gases under various deposition pressures.The effects of sputtering gas type and pressure on the morphology and hydrogen adsorption performance of ZrCoRE films were investigated.Results show that the films prepared in Ar exhibit a relatively dense structure with fewer grain boundaries.The increase in Ar pressure results in more grain boundaries and gap structures in the films.In contrast,films deposited in Kr display a higher density of grain boundaries and cluster structures,and the films have an obvious columnar crystal structure,with numerous interfaces and gaps distributed between the columnar structures,providing more paths for gas diffusion.As Kr pressure increases,the film demonstrates more pronounced continuous columnar structure growth,accompanied by deeper and wider grain boundaries.This structural configuration provides a larger specific surface area,which significantly improves the hydrogen adsorption speed and capacity.Consequently,high Ar and Kr pressures are beneficial to improve the adsorption performance. 展开更多
关键词 NEG film magnetron sputtering KRYPTON sputtering pressure hydrogen adsorption performance
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Magnetron sputter and phase change optimization of waferlevel GeTe films for RF switch
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作者 Shihang Liu Hanxiang Jia +2 位作者 Shuangzan Lu Changyu Hu Jun Liu 《Journal of Semiconductors》 2025年第7期108-114,共7页
With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteris... With the rapid advancement of 5G communication technology,increasingly stringent demands are placed on the performance and functionality of phase change switches.Given that RF and microwave signals exhibit characteristics of high frequency,high speed,and high precision,it is imperative for phase change switches to possess fast,accurate,and reliable switching capabilities.Moreover,wafer-level compositional homogeneity and resistivity uniformity during semiconductor manufacturing are crucial for ensuring the yield and reliability of RF switches.By controlling magnetron sputter of GeTe through from four key parameters(pressure,power,Ar flow,and post-annealing)and incorporating elemental proportional compensation in the target,we achieved effective modulation over GeTe uniformity.Finally,we successfully demonstrated the process integration of GeTe phase-change RF switches on 6-inch scaled wafers. 展开更多
关键词 GETE magnetron sputter phase change in-wafer uniformity RF switch
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Magnetron sputtered nickel oxide with suppressed interfacial defect states for efficient inverted perovskite solar cells
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作者 Guoqiang Ma Qin Tan +8 位作者 Zhaoning Li Jingwei Xiu Jiafeng Wang Tianle Cheng Dong He Qiang Sun Xuhang Ma Francesco Lamberti Zhubing He 《Journal of Energy Chemistry》 2025年第1期348-355,共8页
Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impa... Widely used spin-coated nickle oxide (NiOx) based perovskite solar cells often suffer from severe interfacial reactions between the NiOxand adjacent perovskite layers due to surface defect states,which inherently impair device performance in a long-term view,even with surface molecule passivation.In this study,we developed high-quality magnetron-sputtered NiOxthin films through detailed process optimization,and compared systematically sputtered and spin-coated NiOxthin film surfaces from materials to devices.These sputtered NiOxfilms exhibit improved crystallinity,smoother surfaces,and significantly reduced Ni3+or Ni vacancies compared to their spin-coated counterparts.Consequently,the interface between the perovskite and sputtered NiOxfilm shows a substantially reduced density of defect states.Perovskite solar cells (PSCs) fabricated with our optimally sputtered NiOxfilms achieved a high power conversion efficiency (PCE) of up to 19.93%and demonstrated enhanced stability,maintaining 86.2% efficiency during 500 h of maximum power point tracking under one standard sun illumination.Moreover,with the surface modification using (4-(2,7-dibromo-9,9-dimethylacridin-10(9H)-yl)butyl)p hosphonic acid (DMAcPA),the device PCE was further promoted to 23.07%,which is the highest value reported for sputtered NiOxbased PSCs so far. 展开更多
关键词 Nickle oxide magnetron sputter DEFECT Stability Perovskite solar cell
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Experimental Demonstration of Multiport Magnetron Units with Specific Power Distribution toward Phased Array Applications
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作者 Da-gui SHEN Liang-jie BI +7 位作者 Yu QIN Pan CUI Xin-yu JIANG Rui GUO Hai-long LI Bin WANG Lin MENG Yong YIN 《真空电子技术》 2025年第3期26-35,共10页
In this paper,three magnetrons with each of them having specifically designed multiple coupling ports,which deliver specific power distribution for developing a magnetron array based on efficient phase locking between... In this paper,three magnetrons with each of them having specifically designed multiple coupling ports,which deliver specific power distribution for developing a magnetron array based on efficient phase locking between them,are proposed to produce high powerμs-level pulses.To demonstrate the effectiveness of the magnetron with one and two coupling ports as a unit for efficient phase locking,we designed experimentally the coupling ports delivering~10%(the power distribution ratio)of the output power of the magnetron for coupling with other magnetron units.The effect of one and two coupling ports on the operating capability,including the power distribution ratio,anode current and frequency,is demonstrated by establishing an equivalent experimental model which can characterize an ideal operation of the array.The experimental results show that the power distribution ratio is~9%for the magnetron with one coupling port,and~12.5%(coupling port 1,2)for the magnetron with two coupling ports.This shows good uniformity of the coupling capability of the two coupling ports and provides guidance for optimizing the power distribution ratio of multiport magnetron units,which are critical for efficient phase locking in the proposed array in future and higher power arrays. 展开更多
关键词 magnetronS phased array high power phase locking vacuum electronics
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Solution for Environmentally Friendly Silver Surface Magnetron Sputtering Color Titanium Film Layer Technology
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作者 Huan Zhu Krisada Daoruang Chalisa Apiwathnasorn 《Journal of Environmental & Earth Sciences》 2025年第1期562-572,共11页
Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the el... Silver is an elegant white precious metal,but it is easily oxidized by O3,SO2,and H2S in the air,turning yellow or dark,which affects its decorative effect.The existing silver coating,primarily prepared through the electroplating process,poses serious environmental pollution problems.It is necessary to seek new,green,and environmentally friendly coating processes while also enhancing the color palette of silver jewelry coatings.Titanium film layers were deposited on Ag925 and Ag999 surfaces using magnetron sputtering coating technology.The effects of sputtering time,substrate surface state,reaction gas type and time,and film thickness on the color of the film layers were studied,and the anti discoloration performance of the obtained film layers under the optimal process was tested.The experimental results show that when the sputtering time varies from 5 to 10 minutes,injecting argon,oxygen,and nitrogen into the coating chamber yields rich colors such as purple with a red tint,blue,yellow green,yellowish purple,and blue purple.The precise control of gas injection time has a significant impact on the color of the film layer.In terms of anti tarnish performance,the film showed good stability in the artificial sweat immersion test.From an environmental perspective,the magnetron sputtering titanium film process has no harmful gas or liquid emissions,which aligns with the sustainable development trend of the jewelry industry and holds great promise for application.This study has improved the visual effect and practical performance of the product,providing important theoretical basis and experimental data support for the application of environmentally friendly silver surface vacuum magnetron sputtering titanium thin film coating technology. 展开更多
关键词 Environmental Protection magnetron Sputtering SILVER Colored Film Titanium Film Layer
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Innovative surface modification strategy for ADN:PFOA-interlayered and vibrational magnetron sputtering for constructing anti-hygroscopic composite structures
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作者 Yinan Lyu Xiaoxia Ma +3 位作者 Xiaoting Ren Shuping Sun Lin Shi Li Yang 《Defence Technology(防务技术)》 2025年第10期295-305,共11页
Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulat... Ammonium dinitramide(ADN),as a high-energy oxidizer widely applied in the field of rocket and missile propellants,has a prominent issue of high hygroscopicity due to its strong polarity.The previous coating encapsulation methods have struggled to address the problems of uneven coating and polarity mismatch.This research innovatively introduces perfluorooctanoic acid(PFOA)as a polar transition intermediate layer.Utilizing the polarity of one end of it to adsorb on the surface of ADN through hydrogen bonds,the problem of polarity mismatch is effectively overcome.Meanwhile,the vibrational magnetron sputtering process has been first applied in the energetic field,with a special vibrating abutment enhancing ADN particle fluidity to solve coating non-uniformity,thus preparing prilled ADN@PFOA@PTFE core-dual-shell composites.Performance tests reveal that this composite material possesses excellent hydrophobic and anti-hygroscopic properties.When left at 25℃and 75%RH for 3 days,moisture absorption was reduced by more than 90%compared to pure ADN.Simultaneously,its thermal stability,heat release performance,and combustion performance have been improved.The research achievements optimize the storage conditions of ADN in the application of rocket and missile propellants,providing solid support and broad development prospects for technological innovation in military fields. 展开更多
关键词 Ammonium dinitramide(ADN) Vibrational magnetron sputtering Core-dual-shell composites Hydrophobic Polarity matching
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Characteristics of radio-frequency magnetron sputtering with Ag target operated near the electron series resonance oscillation
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作者 Chao YE 《Plasma Science and Technology》 2025年第3期111-117,共7页
The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The... The discharge and plasma characteristics of Ag magnetron sputtering discharge operated near the electron series resonance(ESR)oscillation,which was excited using the driving frequency of 27.12 MHz,was investigated.The imaginary part of impedance was found to undergo a transition from capacitive to inductive on varying radio-frequency(RF)power,and the conditions for the ESR excitation were satisfied.The current–voltage(I–V)characteristic of discharge showed that the lower discharge voltage with higher current was an important feature of RF magnetron sputtering operated near the ESR oscillation,which was caused by the small impedance Z originated from the mutual compensation between the sheath capacitive reactance and the plasma inductive reactance.The higher electron temperature,ion flux density and ion energy as well as the moderate electron density were obtained.The interaction of higher energy ions on substrate surface improved the crystallographic quality of Ag films.Therefore,the 27.12 MHz magnetron sputtering operated near the ESR oscillation has better deposition characteristics than that of commercial 13.56 MHz RF magnetron sputtering. 展开更多
关键词 electron series resonance magnetron sputtering radio-frequency discharge
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Constructing high-entropy spinel oxide thin films via magnetron sputtering for efficiently electrocatalyzing alkaline oxygen evolution reaction
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作者 Yuhui Chen Congbao Guo +2 位作者 Yi Wang Kun Wang Shuqin Song 《Chinese Journal of Catalysis》 2025年第10期210-219,共10页
Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchang... Ensuring high electrocatalytic performance simultaneously with low or even no precious-metal usage is still a big challenge for the development of electrocatalysts toward oxygen evolution reaction(OER)in anion exchange membrane water electrolysis.Here,homogeneous high entropy oxide(HEO)film is in-situ fabricated on nickel foam(NF)substrate via magnetron sputtering technology without annealing process in air,which is composed of many spinel-structured(FeCoNiCrMo)_(3)O_(4) grains with an average particle size of 2.5 nm.The resulting HEO film(abbreviated as(FeCoNiCr-Mo)_(3)O_(4))exhibits a superior OER performance with a low OER overpotential of 216 mV at 10 mA cm^(–2) and steadily operates at 100 mA cm^(–2) for 200 h with a decay of only 272μV h^(–1),which is far better than that of commercial IrO_(2) catalyst(290 mV,1090μV h^(–1)).Tetramethylammonium cation(TMA^(+))probe experiment,activation energy analysis and theoretical calculations unveil that the OER on(FeCoNiCrMo)_(3)O_(4) follows an adsorbate evolution mechanism pathway,where the energy barrier of rate-determining step for OER on(FeCoNiCrMo)_(3)O_(4) is substantially lowered.Also,methanol molecular probe experiment suggests that a weakened ^(*)OH bonding on the(FeCoNiCrMo)_(3)O_(4) surface and a rapid deprotonation of ^(*)OH,further enhancing its OER performance.This work provides a feasible solution for designing efficient high entropy oxides electrocatalysts for OER,accelerating the practical process of water electrolysis for H2 production. 展开更多
关键词 High entropy spinel oxide magnetron sputtering Alkaline water electrolysis Oxygen evolution reaction
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Influence of sputtering gases on the properties of Mg-doped NiO thin films prepared by radio-frequency magnetron co-sputtering method
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作者 WANG Xin LUO Minghai +2 位作者 CONG Fanchao CHEN Yili XIA Jinghan 《Optoelectronics Letters》 2025年第12期716-719,共4页
By doping with Mg atoms,the bandgap of Mg-doped NiO thin films can be adjusted larger.By using NiO and MgO as sputtering targets,Mg-doped NiO thin films were deposited using radio-frequency magnetron co-sputtering met... By doping with Mg atoms,the bandgap of Mg-doped NiO thin films can be adjusted larger.By using NiO and MgO as sputtering targets,Mg-doped NiO thin films were deposited using radio-frequency magnetron co-sputtering method in pure argon and pure oxygen gas,respectively.The crystal structure,morphological characteristics,composition and optical properties of the obtained films were compared by X-ray diffraction(XRD),scanning electron microscope(SEM),energy dispersive spectrometer(EDS)and ultraviolet(UV)-visible spectrophotometer.The properties of the thin films deposited in different sputtering gases are quite different.For the films deposited in pure argon gas,it is a polycrystalline thin film with(200)preferred orientation,while the film deposited in pure oxygen has no preferred orientation.The grain size,molar ratio of Mg to Ni atoms and optical bandgap are larger for the films deposited in pure argon gas than those deposited in oxygen gas. 展开更多
关键词 dispersive spectrometer eds crystal structuremorphological sputtering targetsmg doped oxygen gasrespectivelythe Mg doped NiO thin films radio frequency magnetron co sputtering bandgap sputtering gases
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Corrosion resistance of self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes Ti_(3)AlC_(2)coating deposited by magnetron sputtered on copper
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作者 WANG Guo-qing WANG Ning +5 位作者 HU Yi-teng WANG Jing GAO Chuan-hui WANG Jie XUE Jun-jie YAN Ke-xin 《Journal of Central South University》 2025年第3期867-881,共15页
Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines pla... Copper is a versatile material,commonly utilized in power transmission and electronic devices,but its relative high reactivity necessitates a long-lasting protective technique.Here,we report a method that combines plasma-enhanced non-equilibrium magnetron sputtering physical vapor deposition(PEUMS-PVD)and anodization to construct a self-healing three-dimensional Ti/Al-doped TiO_(2)nanotubes/Ti_(3)AlC_(2)coating on the surface of Cu substrates.This novel strategy enhances the corrosion resistance of copper substrates in marine environments,with corrosion current densities of up to 4.5643×10^(−8)A/cm^(2).Among them,the doping of nano-aluminum particles makes the coating self-healing.The mechanistic analysis of the corrosion behaviors during early immersion experiments was conducted using electrochemical noise,and revealed that during the initial stages of coating immersion,uniform corrosion predominates,with a minor occurrence of localized corrosion. 展开更多
关键词 magnetron sputtering TiO_(2)nanotubes Ti_(3)AlC_(2)coating corrosion resistance performance
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Influence and determinative factors of ion-to-atom arrival ratio in unbalanced magnetron sputtering systems 被引量:8
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作者 Jun Zhou Zhe Wu Zhanhe Liu 《Journal of University of Science and Technology Beijing》 CSCD 2008年第6期775-781,共7页
Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputterin... Low pressure sputtering with a controlled ratio of ion flux to deposited atom flux at the condensing surface is one of the main directions of development of magnetron sputtering methods. Unbalanced magnetron sputtering, by producing dense secondary plasma around the substrate, provides a high ion current density. The closed-field unbalanced magnetron sputtering system (CFUBMS) has been established as a versatile technique for high-rate deposition high-quality metal, alloy, and ceramic thin films. The'key factor in the CFUBMS system is the ability to transport high ion currents to the substrate, which can enhance the formation of full dense coatings at relatively low value homologous temperature. The investigation shows that the energy of ions incidenced at the substrate and the ratio of the flux of these ions to the flux of condensing atoms are the fundamental parameters in determining the structure and properties of films produced by ion-assisted deposition processes. Increasing ion bombardment during deposition combined with increasing mobility of the condensing atoms favors the formation of a dense microstructure and a smooth surface. 展开更多
关键词 magnetron sputtering closed-field unbalanced magnetron sputtering system (CFUBMS) ion-to-atom ratio unbalancedmagnetron sputtering
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Synthesis of One-Dimensional ZnO Na norods by Oxidating Zinc Films Deposited with Magnetron Sputtering 被引量:5
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作者 石礼伟 李玉国 +2 位作者 王强 薛成山 王书运 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第10期1211-1214,共4页
One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro per... One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro perties of nanorods are investigated.X-ray diffraction(XRD) pattern,scanning el ectron microscopy(SEM),and transmission electron microscopy(TEM) analyses show t hat the synthesized single-crystal ZnO nanorods develop like hairpins along dif ferent radials,with a hexagonal wurtzite structure.The diameters of nanorods ran ge between 30 and 60nm and lengths up to micrometers.Photoluminescence(PL) analy sis shows that,under 280nm light excitation,a strong and sharp near band-edge U V light emission band at 372nm and a relatively weak green deep-level light emi ssion band at 516nm are observed from the ZnO nanorods,which indicates excellent crystallization and optical quality of the fabricated ZnO nanorods. 展开更多
关键词 magnetron sputtering thermal oxidation ZNO nan orods properties
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Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature 被引量:3
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作者 孙宜华 王海林 +2 位作者 陈剑 方亮 王磊 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2016年第6期1655-1662,共8页
Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of ... Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV. 展开更多
关键词 AZO thin film microstructure optoelectronic properties RF magnetron sputtering
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Properties of W/DLC/W-S-C composite films fabricated by magnetron sputtering 被引量:2
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作者 代明江 韦春贝 +4 位作者 周克崧 朱敏 侯惠君 林松盛 佟鑫 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第9期3002-3011,共10页
A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of... A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of the composite films was studied in the conditions of the ambient air and N2 gas atmosphere by ball-on-disk tester.The results indicate that the composite films show dense and amorphous microstructure.The WCx and WSx compounds are found in amorphous diamond like carbon matrix in the top layers of W-S-C.A proper WSx content is beneficial for improving the adhesion of the composite films.In air atmosphere,the composite films with high C content have better wear resistance and the friction coefficients range from 0.15 to 0.25.In N2 condition,high WSx content is benefit for the wear resistance and the friction coefficients of the composite films range from 0.03 to 0.1. 展开更多
关键词 W/DLC/W-S-C composite film magnetron sputtering adhesion strength friction coefficient
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Effect of Zn and Ti mole ratio on microstructure and photocatalytic properties of magnetron sputtered TiO_2-ZnO heterogeneous composite film 被引量:2
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作者 白力静 寇钢 +1 位作者 龚振瑶 赵志明 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第12期3643-3649,共7页
Series of TiO 2-ZnO heterojunction composite films with different n(Zn)/n(Ti) ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the ... Series of TiO 2-ZnO heterojunction composite films with different n(Zn)/n(Ti) ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the current values of sputtering target. The effects of n(Zn)/n(Ti) on the microstructures of TiO2-ZnO films were investigated by SEM, AFM, Raman and XPS, and their photocatalytic decomposition of methyl orange solutions was evaluated. The results show that an increase in n(Zn)/n(Ti) typically results in a decrease in the grain size of composite films firstly and then an increase of grain size, while an increase in n(Zn)/n(Ti) leads to an increase in film roughness firstly and then a decrease in film roughness. Both grain size and roughness of TiO2-ZnO films reach the maximum and minimum at n(Zn)/n(Ti) of 1/9.3, respectively. The n(Zn)/n(Ti) shows little effect on the valences of Zn and Ti elements, which mainly exist in the form of TiO2 and ZnO phases. The n(Zn)/n(Ti) has influence on the amount of anatase/rutile TiO2 heterojunction in the film. With increase of the n(Zn)/n(Ti), the absorption intensity of the composite film increases and the absorption region extends to 450 nm, which is redshifted as much as 150 nm in comparison with the pure TiO2 films. However, the photocatalytic abilities of heterogeneous composite films do not depend on the n(Zn)/n(Ti) but rather on the microstructures of the TiO2-ZnO composite films. Degradation rate of the film reaches the maximum and the photocatalytic decomposition of pollutants works best when n(Zn)/n(Ti)=1:9.3. 展开更多
关键词 magnetron sputtering TiO2-ZnO thin films Zn to Ti mole ratio MICROSTRUCTURE PHOTOCATALYTIC
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Effect of bias voltage on compositional, mechanical and corrosion property of ZrNbAlN multilayer films by unbalanced magnetron sputtering 被引量:2
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作者 石永敬 潘复生 +2 位作者 鲍明东 潘虎成 Muhammad RASHAD 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2014年第9期2856-2863,共8页
Nano-scaled ZrNbAlN films with different negative bias voltages(Vb) were deposited on bronze substrate and Si(100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properti... Nano-scaled ZrNbAlN films with different negative bias voltages(Vb) were deposited on bronze substrate and Si(100) wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properties were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. It is found that mole concentrations of Zr and Nb are affected by Vb, which leads to the increase of binding energy of N 1s and Al 2p and decrease of binding energy of Zr 3d5/2 and Nb 3d5/2. Surface morphologies evolution controlled by Vb could be observed. Furthermore, X-ray diffraction patterns reveal that these films show a(111) preferred orientation. Moreover, mechanical property and corrosion behavior of ZrNbAlN films were characterized by nanoindentation test and corrosion test, respectively. A maximum value of 21.85 GPa at-70 V occurs in the ZrNbAlN- bronze system, which outperforms uncoated bronze. Corrosion experiments in 0.5 mol/L NaCl and 0.5 mol/L HCl solution show that corrosion potential and corrosion current are dependent on Vb, and better anti-corrosion property could be obtained at-90 V. 展开更多
关键词 ZrNbAlN multilayer film magnetron sputtering COMPOSITION CORROSION
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Recent Developments in Magnetron Sputtering 被引量:2
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作者 于翔 王成彪 +2 位作者 刘阳 于德洋 邢廷炎 《Plasma Science and Technology》 SCIE EI CAS CSCD 2006年第3期337-343,共7页
The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetro... The principle of magnetron sputtering is introduced andthe balanced and unbalanced magnetrons are compared andthe necessity of unbalanced magnetrons is explained as well. Several recent developments in plasma magnetron sputtering, i.e., unbalanced magnetron sputtering, pulsed magnetron sputtering and ion assisted sputtering, are discussed. The recent developments of unbalanced magnetron systems and their incorporation with ion sources result in an understanding in growingimportance of the magnetron sputtering technology, which makes the technology an applicable deposition process for a variety of important films, such as wear-resistant films and decorative films. 展开更多
关键词 balanced and unbalanced magnetron sputtering mid-frequency magnetron sputtering ion assisted sputtering
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Microstructure and Nonlinear Optical Properties of Very Small Size GaAs Nanogranulae Embedded in SiO_2 Matrix by Magnetron Co-Sputtering
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作者 丁瑞钦 王浩 +2 位作者 佘卫龙 丘志仁 罗莉 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第3期238-245,共8页
Microstructure of GaAs/SiO 2 nanogranular thin films fabricated by radio frequency magnetron co sputtering technique and postannealing are investigated via atomic force microscope,X ray diffraction,and Rutherford b... Microstructure of GaAs/SiO 2 nanogranular thin films fabricated by radio frequency magnetron co sputtering technique and postannealing are investigated via atomic force microscope,X ray diffraction,and Rutherford backscattering spectroscopy.The results show that GaAs nanocrystals with average diameters from 1 5nm to 3 2nm (depending on the annealing temperature) are uniformly dispersed in the SiO 2 matrices.GaAs and SiO 2 are found in normal stoichiometry in the films.The nonlinear optical refraction and nonlinear optical absorption are studied by Z scan technique using a single Gaussian beam of pulse laser.The third order nonlinear optical refractive index and nonlinear absorption coefficient are enhanced due to the quantum confinement effects and estimated to be 4×10 -12 m 2/W and 2×10 -5 m/W respectively in nonresonant condition,while 2×10 -11 m 2/W and -1×10 -4 m/W respectively in quasi resonant condition. 展开更多
关键词 magnetron co sputtering GaAs nanogranula MICROSTRUCTURE optical nonlinearity
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Deposition of a-CN<sub>x</sub>:H Films Using Uniform Supermagnetron Plasma under a Stationary Magnet Field
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作者 Haruhisa Kinoshita Syunsuke Yagi Motoki Sakurai 《Journal of Modern Physics》 2013年第5期587-590,共4页
By generating closed-loop electron E × B drift over the front and back surface of a band magnetron cathode, a uniform magnetron plasma can be formed over the front surface. Here, we attempted to generate a unifor... By generating closed-loop electron E × B drift over the front and back surface of a band magnetron cathode, a uniform magnetron plasma can be formed over the front surface. Here, we attempted to generate a uniform supermagnetron plasma under a stationary magnetic field by situating two such band magnetron cathodes face-to-face in parallel. Performing uniform supermagnetron plasma chemical vapor deposition (CVD) with tetraethylorthosilicate (TEOS)/O2 CVD, SiO2 films with good uniformity (±5%) at the central region of the cathode could be achieved under a stationary magnetic field of about 160 G. Using this supermagnetron plasma CVD apparatus, a-CNx:H films were then deposited to investigate their characteristics using isobutane (i-C4H10)/N2 mixed gases. A relatively high deposition rate of about 100 nm/min was obtained. The a-CNx:H films obtained had a hardness of about 25 GPa, higher than that of glass (22 GPa). 展开更多
关键词 SiO2 FILM a-CNx:H FILM Supermagnetron PLASMA Band magnetron CVD
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