The morphologies of tunnel tips in different stages for aluminum foils during DC etching in 1.5 mol/L HC1 solution at 90℃ were observed by field emission scanning electron microscopy （FE-SEM）. A novel model was pro...The morphologies of tunnel tips in different stages for aluminum foils during DC etching in 1.5 mol/L HC1 solution at 90℃ were observed by field emission scanning electron microscopy （FE-SEM）. A novel model was proposed to describe the morphological evolution of tunnel tips throughout the growth processes. In the pit nucleation stage, the pits vary from the hemispherical to half-cubic shapes due to the activation of pit tips from the center to the edge. During the tunnel growth stage, the pits dissolve toward the depth direction and develop into the tunnels, and their tips remain flat. In the tip passivation stage, as the passivation of tunnel tips speeds up from the edge to the center＇s the tunnel tips change from flat shapes to three-dimensional protrusions. The mechanism may be attributed to the order of activation or passivation on the tunnel tips changed in different stages.展开更多
Superhydrophobic aluminum surfaces with a high water contact angle and low sliding angle on aluminum plate substrate were fabricated by means of surface etching with sodium hydroxide under ultrasonic bathing and then ...Superhydrophobic aluminum surfaces with a high water contact angle and low sliding angle on aluminum plate substrate were fabricated by means of surface etching with sodium hydroxide under ultrasonic bathing and then modification with fluorosilane. Scanning electron microscopy（SEM） showed a honeycomb-like structure on aluminum substrate surface after etching under ultrasonic bathing. And the surface was rendered from superhydrophilicity to superhydrophobicity after further modification with fluorosilane.展开更多
An inductively coupled plasma (ICP) discharge and its etching behaviors for aluminum alloys were investigated in this report. A radio frequency power supply was used for plasma generation. The unique hardware configur...An inductively coupled plasma (ICP) discharge and its etching behaviors for aluminum alloys were investigated in this report. A radio frequency power supply was used for plasma generation. The unique hardware configuration enabled one to control ion energy separately from plasma density. Plasma properties were measured with a Langmuir probe. Electron temperature, plasma potential and plasma density were found to be comparable with those reported from Electron Cyclotron Resonance (ECR) and other types of reactors[1].A mixture of HBr and chlorine gases were used for this aluminum etch study. Experimental matrices were designed with Response Surface Methodology (RSM) to analyze the process trends versus etch parameters, such as source power, bias power and gas composition. An etch rate of 8500A to 9000A per minute was obtained at 5 to 15 mTorr pressure ranges. Anisotropic profiles with high photoresist selectivity (5 to 1) and silicon dioxide selectivity greater than 10 were achieved with HBr addition into chlorine plasma.Bromine-containing chemistry for an aluminum etch in a low pressure ICP discharge showed great potential for use in ULSI fabrication. In addition, the hardware used was very simple and the chamber size was much smaller than other high density plasma sources.展开更多
Introduction of titanium oxides with high permittivity on etched aluminum foils’ surface has been successfully utilized to increase specific capacitance of anode foils for aluminum electrolytic capacitors. In order t...Introduction of titanium oxides with high permittivity on etched aluminum foils’ surface has been successfully utilized to increase specific capacitance of anode foils for aluminum electrolytic capacitors. In order to quantify the concentration of titanium (IV) on the etched aluminum foil precisely, a simple and rapid spectrophotometric procedure has been developed. After optimizing a series of variables including absorbance wavelength, concentration of nitric acid, concentration of hydrogen peroxide, nitration time and developing time, analytical precision and accuracy were tested by using standard working solution containing known amount of titanium (IV). The results showed that Lambert-Beer’s law was obeyed in the range of 0.01 to 3.00 mmol·L﹣1. The relative standard deviation (RSD) ranged from 0.67% to 1.09% (n = 6), and the recovery was between 99.17% - 100.03%. Investigation on effect of Al3+ ion indicated that there was no interference in the absorbance of titanium (IV) at 410 nm. The proposed procedure was applied to real samples for the determination of titanium (IV), and the results were in a good agreement with the values certified by inductively coupled plasma-atomic emission spectrometry (ICP-AES).展开更多
The limiting length of tunnels, llim, of Al foil electro-etched in HCl-H2SO4 solution and the corresponding anodic polarization curves in the same solution were measured. It is found that there is a dependence of llim...The limiting length of tunnels, llim, of Al foil electro-etched in HCl-H2SO4 solution and the corresponding anodic polarization curves in the same solution were measured. It is found that there is a dependence of llim on the potential difference, △φ, between the pitting potential, φpit, and the corrosion potential, φcorr, of Al foil, when the temperature and H2SO4 concentration of HCl-H2SO4 electrolyte are changed. The dynamic equation on the tunnel growing and the linear equation between llim and △φ were deduced by analyzing the relationship among the over-potential on Al foil surface, the transport over-potential in tunnel solution and the over-potential at tunnel tip during the electro-etching. The results show that the growing velocity of tunnels decreases with their extending in length and the changing trend of llim can be judged by measuring △φ, which supplies a convenient access to explore new kinds of etchants.展开更多
After electrolytically etched pattern graining surface of aluminum alloy, it is shows that there are porous oxide film containing α Al 2O 3 and α Al 2O 3 by means of SEM XRD and XPS analysis. In the ditches, a...After electrolytically etched pattern graining surface of aluminum alloy, it is shows that there are porous oxide film containing α Al 2O 3 and α Al 2O 3 by means of SEM XRD and XPS analysis. In the ditches, anodic oxidation makes pore density and diameter larger than other areas, and causes more coloring metal depositing and mutual cross linking. The electrolytically etched pattern surface shows relative deeper color on the ditches and lighter color on other areas, so it can be used for decoration. Electrolytic coloring metal exists in forms of Ag colloid and Ag 2O. Both anodic oxidation and electrolytic coloring affect the surface microstructure of aluminum alloy.展开更多
Ni nanowires were prepared by electrodeposition in porous anodized aluminum oxide （AAO） template from a composite electrolyte solution. Well-ordered Ni nanowire arrays with controllable length were then made by the ...Ni nanowires were prepared by electrodeposition in porous anodized aluminum oxide （AAO） template from a composite electrolyte solution. Well-ordered Ni nanowire arrays with controllable length were then made by the partial removal of AAO using a mixture of phosphoric acid and chromic acid （6 wt pct H3PO4：1.8 wt pct H3CrO4）. The images of Ni nanowire arrays were studied by scanning electron microscopy （SEM） to determine the relationship between etching time and the length of Ni nanowire arrays. The results indicate that the length of nanowires exposed from the template can be accurately controlled by controlling etching time.展开更多
The lap-shear strength and durability of adhesive bonded AI alloy joints with different pretreatments were studied by the lap-shear test and wedge test. The results indicate that the maximum lap-shear strength and dur...The lap-shear strength and durability of adhesive bonded AI alloy joints with different pretreatments were studied by the lap-shear test and wedge test. The results indicate that the maximum lap-shear strength and durability of the bonding joints pretreated by different processes are influenced by the grade of abrasive papers and can be obviously improved by phosphoric acid anodizing. Alkali etching can obviously improve the durability of bonding joints although it slightly influences the maximum lap-shear strength. The process which is composed of grit-finishing, acetone degreasing, alkali etching and phosphoric acid anodizing, provides a better adhesive bonding property of Al alloy.展开更多
基金the financial support by the Guangxi Hezhou Guidong Electronics Technology Co.Ltd.the Research Project of Guangxi Zhuang Autonomous Region(Nos.1346011-7 and 1298019-11)
文摘The morphologies of tunnel tips in different stages for aluminum foils during DC etching in 1.5 mol/L HC1 solution at 90℃ were observed by field emission scanning electron microscopy （FE-SEM）. A novel model was proposed to describe the morphological evolution of tunnel tips throughout the growth processes. In the pit nucleation stage, the pits vary from the hemispherical to half-cubic shapes due to the activation of pit tips from the center to the edge. During the tunnel growth stage, the pits dissolve toward the depth direction and develop into the tunnels, and their tips remain flat. In the tip passivation stage, as the passivation of tunnel tips speeds up from the edge to the center＇s the tunnel tips change from flat shapes to three-dimensional protrusions. The mechanism may be attributed to the order of activation or passivation on the tunnel tips changed in different stages.
文摘Superhydrophobic aluminum surfaces with a high water contact angle and low sliding angle on aluminum plate substrate were fabricated by means of surface etching with sodium hydroxide under ultrasonic bathing and then modification with fluorosilane. Scanning electron microscopy（SEM） showed a honeycomb-like structure on aluminum substrate surface after etching under ultrasonic bathing. And the surface was rendered from superhydrophilicity to superhydrophobicity after further modification with fluorosilane.
文摘An inductively coupled plasma (ICP) discharge and its etching behaviors for aluminum alloys were investigated in this report. A radio frequency power supply was used for plasma generation. The unique hardware configuration enabled one to control ion energy separately from plasma density. Plasma properties were measured with a Langmuir probe. Electron temperature, plasma potential and plasma density were found to be comparable with those reported from Electron Cyclotron Resonance (ECR) and other types of reactors[1].A mixture of HBr and chlorine gases were used for this aluminum etch study. Experimental matrices were designed with Response Surface Methodology (RSM) to analyze the process trends versus etch parameters, such as source power, bias power and gas composition. An etch rate of 8500A to 9000A per minute was obtained at 5 to 15 mTorr pressure ranges. Anisotropic profiles with high photoresist selectivity (5 to 1) and silicon dioxide selectivity greater than 10 were achieved with HBr addition into chlorine plasma.Bromine-containing chemistry for an aluminum etch in a low pressure ICP discharge showed great potential for use in ULSI fabrication. In addition, the hardware used was very simple and the chamber size was much smaller than other high density plasma sources.
文摘Introduction of titanium oxides with high permittivity on etched aluminum foils’ surface has been successfully utilized to increase specific capacitance of anode foils for aluminum electrolytic capacitors. In order to quantify the concentration of titanium (IV) on the etched aluminum foil precisely, a simple and rapid spectrophotometric procedure has been developed. After optimizing a series of variables including absorbance wavelength, concentration of nitric acid, concentration of hydrogen peroxide, nitration time and developing time, analytical precision and accuracy were tested by using standard working solution containing known amount of titanium (IV). The results showed that Lambert-Beer’s law was obeyed in the range of 0.01 to 3.00 mmol·L﹣1. The relative standard deviation (RSD) ranged from 0.67% to 1.09% (n = 6), and the recovery was between 99.17% - 100.03%. Investigation on effect of Al3+ ion indicated that there was no interference in the absorbance of titanium (IV) at 410 nm. The proposed procedure was applied to real samples for the determination of titanium (IV), and the results were in a good agreement with the values certified by inductively coupled plasma-atomic emission spectrometry (ICP-AES).
基金Project supported by University New Materials Disciplines Construction Program of Beijing, China
文摘The limiting length of tunnels, llim, of Al foil electro-etched in HCl-H2SO4 solution and the corresponding anodic polarization curves in the same solution were measured. It is found that there is a dependence of llim on the potential difference, △φ, between the pitting potential, φpit, and the corrosion potential, φcorr, of Al foil, when the temperature and H2SO4 concentration of HCl-H2SO4 electrolyte are changed. The dynamic equation on the tunnel growing and the linear equation between llim and △φ were deduced by analyzing the relationship among the over-potential on Al foil surface, the transport over-potential in tunnel solution and the over-potential at tunnel tip during the electro-etching. The results show that the growing velocity of tunnels decreases with their extending in length and the changing trend of llim can be judged by measuring △φ, which supplies a convenient access to explore new kinds of etchants.
文摘After electrolytically etched pattern graining surface of aluminum alloy, it is shows that there are porous oxide film containing α Al 2O 3 and α Al 2O 3 by means of SEM XRD and XPS analysis. In the ditches, anodic oxidation makes pore density and diameter larger than other areas, and causes more coloring metal depositing and mutual cross linking. The electrolytically etched pattern surface shows relative deeper color on the ditches and lighter color on other areas, so it can be used for decoration. Electrolytic coloring metal exists in forms of Ag colloid and Ag 2O. Both anodic oxidation and electrolytic coloring affect the surface microstructure of aluminum alloy.
基金This work was supported by the National Natural Science Foundation of China under grant No.50473012.
文摘Ni nanowires were prepared by electrodeposition in porous anodized aluminum oxide （AAO） template from a composite electrolyte solution. Well-ordered Ni nanowire arrays with controllable length were then made by the partial removal of AAO using a mixture of phosphoric acid and chromic acid （6 wt pct H3PO4：1.8 wt pct H3CrO4）. The images of Ni nanowire arrays were studied by scanning electron microscopy （SEM） to determine the relationship between etching time and the length of Ni nanowire arrays. The results indicate that the length of nanowires exposed from the template can be accurately controlled by controlling etching time.
文摘The lap-shear strength and durability of adhesive bonded AI alloy joints with different pretreatments were studied by the lap-shear test and wedge test. The results indicate that the maximum lap-shear strength and durability of the bonding joints pretreated by different processes are influenced by the grade of abrasive papers and can be obviously improved by phosphoric acid anodizing. Alkali etching can obviously improve the durability of bonding joints although it slightly influences the maximum lap-shear strength. The process which is composed of grit-finishing, acetone degreasing, alkali etching and phosphoric acid anodizing, provides a better adhesive bonding property of Al alloy.
