摘要
随着紫外大功率准分子激光器的发展,金属反射镜已不能满足要求,所以必须研制低损耗的全介质反射镜。本文描述了波长350nm(XeF)、308nm(XeCl)、248nm(KrF)和193nm(ArF)四种准分子激光反射镜的制备技术,其反射率分别达到99.7％、99.5％ 、98％和96％。在波长308nm,反射镜的激光破坏阈值达8J/cm^2以上。
The some limitations of metallic reflectors, along with the rapid development of powerful excimer laser in UV, required the development of low loss all-dielectric laser reflectors. The excimer laser-reflectors at operating wavelength of 351(XeF), 308(XeCl), and 193nm(ArF) with materials of ZrO2+Y2O3, Al2O3 and SiO2 have been prepared. The reflectance in such refletors reaches 99. 7% at wavelength of 351nm, 99. 5% at 308nm, 98% at 248nm and 96% at 193nm. And the laser damage threshold reaches about 8J/cm2 at wavelength of 308nm.
