摘要
用电子束蒸发法制备TiO2薄膜,详细研究了工艺参数和热处理对TiO2薄膜折射率的影响。得到镀制高折射率的氧化钛薄膜最佳工艺参数:基片温度200℃、真空度2×10-2Pa、沉积速率0.2nm/s。热处理可以提高TiO2薄膜折射率。
TiO2 thin films are prepared by electron beam evaporation. Then the influence of multi-factors to its refractive index of TiO2 film is researched, such as technologic conditions and annealing. Optimal technologic conditions are obtained, they are 200℃ substrate, 2×10^-2 Pa chamber vacuum and 0.2nm/s deposition rate,Annealing will increase the refractive index of TiO2 film.
出处
《西安邮电学院学报》
2008年第5期155-157,共3页
Journal of Xi'an Institute of Posts and Telecommunications
关键词
电子束蒸发
TIO2薄膜
折射率
electron beam evaporation
TiO2 film
refractive index
