摘要
本文以美国 EATON公司的中束流注入机为例 ,阐述了 IC芯片生产过程中离子注入工艺如何实现高质量注入 ;标准注入参数的调整 ,以及实现高速注入所应采取的各种手段 ,尽量发挥离子注入机的潜能 ,使中束流注入机也可以注入大束流 ,在生产上实现高速机动 ,加快了工艺流程。
This Paper related correlative parameter adjusting for IC chip production process in ion implantation technology to realize high quality and standard implantation,and should be adopting every means for the purpose of carrying out high efficiency implantation, make better use the potential of implanter.Improve medium beam current implanter of EATON company of US gives off big beam current,to bring high speed mobility into actuality in production,speeding up technology process.
出处
《微处理机》
2004年第3期12-13,共2页
Microprocessors
