摘要
不锈钢箔片上溅射沉积25nm的钛底膜后,在工作真空0.9Pa,O2、Ar分压比1∶6,基体温度270～280℃的条件下,用直流磁控反应溅射法制备了厚度约300nm的TiO2薄膜,并在420℃的氧气氛下进行热处理。XRD分析看出,薄膜为TiO2锐钛矿和金红石复合晶型。测算表明TiO2复合晶中锐钛矿质量含量约64%,其晶粒尺寸约14nm。用"弯曲法"测试表明,膜基结合力强。由对苯酚溶液的降解实验看出,制备光催化薄膜具有较好的光催化活性。
TiO2 film with a thickness of 300 nm was deposited on stainless steel with a 25 nm Ti buffer layer, by DC reactive magnetron sputtering at a pressure of 0.9 Pa, the pressure ratio of O2 to Ar of 1:6 and the substrate temperature of 270-280°C. The TiO2 film was thermally treated in oxygen vapor at 420°C, XRD analysis shows that the film was composed of TiO2 anatase and rutile crystals with the ingredient of anatase of 64% and the size of crystal of 14 nm. The bending test states the binding strength between film and substrate was high, the experiment on degrading phenol indicates that the film was of photocatalytic activity.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2004年第2期166-168,共3页
Journal of Functional Materials
基金
国家自然科学基金资助项目(50271038)
陕西师范大学重点科研基金资助项目(SD200303)
关键词
纳米TIO2薄膜
光催化活性
磁控反应溅射
不锈钢
制备
苯酚
光催化剂
XRD
Bending strength
Deposition
Magnetron sputtering
Nanostructured materials
Oxygen
Phenols
Photocatalysis
Stainless steel
Substrates
Titanium dioxide
Ultrathin films
X ray diffraction analysis
