摘要
以锆的β-二酮螫合物为源,以微波等离子体化学气相淀积方法合成ZrO_2薄膜过程中,观察到不同淀积条件下出现的四种不同表面形貌。从等离子体的电子温度、电子密度和源物质的浓度等方面对几种形貌的成因进行了讨论。同时用扫描电镜观察了高温退火及等离子体退火对薄膜形貌的影响,以及不同衬底薄膜形貌的差异。
In the ZrO_2 thin films deposition process completed by microwave plasma CVD method, beta diktone chelates as volatile precursors, we find that in different deposition conditions, the thin film surface appears different in morphology. They can be divided into four kinds according to SEM observation. The relationship between morphology and plasma parameters such as electronic temperature, electronic density and source materials concentration is discussed. The effect of high temperature annealing and plasma post-treatment on surface morphology is also studied.
基金
国家自然科学基金
关键词
氧化锆
薄膜
表面
等离子体
CVD
ZrO_2 thin films, surface morphology, microwave plasma assisted CVD
