摘要
针对膜厚的均匀性对非晶硅薄膜透射光谱 (40 0～ 1 0 0 0 nm)的影响问题 ,通过模拟计算分析在不同膜厚、厚度 (线性 )变化率和照射面积条件下 ,厚度均匀性对谱线的影响 .结果表明这种影响主要发生在薄膜的无吸收区和弱吸收区 ,表现为峰—峰值变小和振荡周期畸变 .
In order to investigate the effect of thickness homogeneity of a-Si:H fi lms on optical transmittance spectra,we simulated the spectra(400～1000nm) under different thickness,thickness inhomogeneity and exposure area.The res ults indicated that the influence mainly occurred in transparent zone and weak- absorption zone,which showed the peak-peak values were reduced and vibration pe riod was distorted.However,decrease of exposure area could reduce this influence effectively.
出处
《汕头大学学报（自然科学版）》
2004年第1期50-54,共5页
Journal of Shantou University：Natural Science Edition
