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四甲基硅多光子电离的光谱研究

Spectrum study on Tetramethylsilane Multiphoton Ionization
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摘要 本文利用平行板电离池研究了四甲基硅(TMS)的共振多光子电离(REMPI),得到了激光激发波长在371.00~410.00nm范围内的平行板电离池条件下的REMPI谱.首次观察到了激光激发波长在371.00~410.00nm范围内的多光子电离光谱具有明显的共振结构,首次获得了平行板电离池条件下9个波长处相对粒子信号强度与激光能量之间的关系以及396.04nm处TMS气体的压力与相对离子信号强度之间的关系,主要讨论了TMS的REMPI机理,得出了TMS的解离/电离机理主要为B类光化学行为的结论. In this paper, parallel plate ionization cell is used to investigate resonant multiphoton ionization ( TMS ) . REMPI spectra are gained at the laser excitation wave length in the 371.00-410.00 nm region unde r the condition of parallel plate ionization cell. first we have a conc lusion that mult iphoton ion izat ion ( MPI ) spectra have obv ious resonant structures at the laser excitation wavelength in the 371.00-410.00 nm region; We first ga in the dependence of relative ionic signal intensity on laser energy at nine wavelengths and the dependence of relative ionic signal intensity on TMS gas pressure at 393.04 nm under parallel plate ionization cell.REMPI of TMS is discussed in this paper and the conclusion is gained that TMS multiphoton dissociation/ionizat ion mechanism is ma inly B photon-chemistry behaviour.
出处 《信阳师范学院学报(自然科学版)》 CAS 1992年第3期300-310,共11页 Journal of Xinyang Normal University(Natural Science Edition)
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