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TiN附着膜的应力-应变关系 被引量:1

STRESS-STRAIN RELATIONSHIP OF A TiN FILM ADHERENT TO SUBSTRATE
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摘要 利用等离子体辅助化学气相沉积法(PACVD)在60Mn钢基片上沉积2.5μm厚的TiN膜,借助X射线应力分析技术和微拉伸设备,测量该附着膜纵向(加载方向)应力和横向应力及外载应变,进而求其等效应力-等效单轴应变关系,并由此算得它的条件屈服点σ_(0.1)和σ_(0.2)分别为4.2和4.4 GPa,加工硬化指数为0.36,用纳米压痕仪测得其硬度为25 GPa,弹性模量为420 GPa,TiN膜在拉伸过程中发生了塑性变形。 By plasma-assisted chemical vapor deposition (PACVD), TiN film with 2.5 mum thickness was deposited on a strip of spring steel 60Mn, which can be subjected to tensile stress under loading of the film/substrate. Longitudinal and transverse stresses, sigma1, and sigma2, and applied strain, Sa, for TiN film were measured by X-ray tensile test. On the basis of the experimental results, the effective stress (σ) over bar and the effective uniaxial strain (ε(t)) over bar were obtained. According to the (σ) over bar- (ε(t)) over bar relation, the calculated proof stresses, sigma(0.1) and sigma(0.2), of TiN film are 4.2 GPa and 4.4 GPa, respectively. The hardness and Young's modulus determined by nanoindenter are 25 GPa and 420 GPa, respectively. The plastic flow in TiN film occurs under tensile.
出处 《金属学报》 SCIE EI CAS CSCD 北大核心 2003年第7期721-724,共4页 Acta Metallurgica Sinica
基金 国家自然科学基金59931010和50272067
关键词 TiN膜 双轴应力 应力-应变关系 X射线拉伸实验 纳米压痕法 TiN film biaxial stress stress-strain relation X-ray tensile test nanoindentation
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参考文献15

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