摘要
以β-二酮螯合物 Zr(DPM)_4为挥发性源,利用微波等离子体化学气相淀积方法成功地在低温(<300℃)下合成了 ZrO_2薄膜,SEM 观测表明薄膜形貌呈细粒结构,其晶粒尺寸为纳米量级.XRD指出,淀积物中除单斜相 ZrO_2外,还存在亚稳态的四方相.XPS 测量了 Zr3d 的电子结合能,发现较之标准 ZrO_2样品低约0.5eV,XPS 定量分析显示薄膜中含有一定量的 C 及过量的 O(?)对其原因以及在不同的淀积条件、薄膜的形成机制等进行了讨论.
ZrO_2 thin films were successfully prepared on a variety of substrates at a low temperature(<300℃)by microwave plasma CVD proces with beta-diketone Chelate as volatile source.SEM observation indicated that the film morphology was in nanoscale crystallites,XRD exhib-ited that all films consisted of monoclinic and tetragonal phases.It was found that the Zr3d^(5/2)binding energy was lower around O.5eV than standard value.XPS analysis revealed that filmscontained some carbon and excessive oxygen.The deposition behavior and film depositionmechanism were discussed.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1992年第3期323-328,共6页
Journal of Inorganic Materials
