摘要
对离子束反应溅射沉积过程中,同时经氩离子束轰击形成的氧化锆薄膜进行了RBS,XPS,TEM及XRD的微观分析。结果表明,在本实验条件下的形成膜体部分为标准化学计量配比的ZrO_2;形成膜由非晶和微晶构成,晶化程度与薄膜沉积用的衬底材料有关;在Al衬底上沉积膜有介稳立方相和单斜相出现;所有沉积膜表面均沾污碳。
Microanalyses on zirconia films formed with argon ion beam assisted reactive deposition are studied by using RBS, XPS, TEM And XRD.The results show that under the conditions of the experiment stoichiometric ZrO2 can be formed in the bulk of the films.The films consist of amorphous solid and crystallite in which the crystallization degree is dependent on the substrate materials, and metastable cubic and monoclinic phases were discovered in the film deposited on Al substrate. Carbon contamination Was examined on the films deposited on different substrate materials.
出处
《微细加工技术》
1992年第1期29-34,共6页
Microfabrication Technology
关键词
溅射
沉积
氧化锆
薄膜
离子束
Ion beam assisted reactive deposition
Zirconia films
Microana-lyses.
