摘要
用紫外 可见光透射光谱 (UV VIS)并结合键结构的X射线光电子能谱 (XPS)和红外谱 (FTIR)分析 ,研究了电子回旋共振等离子体增强化学气相沉积法制备的氟化非晶碳薄膜的光吸收和光学带隙性质 .在微波功率为 14 0—70 0W、源气体CHF3∶C6 H6 比例为 1∶1— 10∶1条件下沉积的薄膜 ,光学带隙在 1.76— 2 .85eV之间 .薄膜中氟的引入对吸收边和光学带隙产生较大的影响 ,吸收边随氟含量的提高而增大 ,光学带隙则主要取决于CF键的含量 。
The optical property of amorphous fluorinated carbon ( α C∶F) films are investigated, which are prepared by microwave electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD) using trifluromethane (CHF 3) and benzene (C 6H 6) as source gases. The optical energy gap E g of the α C∶F films deposited at 140—700W powers and CHF 3∶C 6H 6=1∶1—10∶1 are between 1.76 and 2.85eV. The amount of fluorine in the films has an effect on optical absorption and energy gap. The absorption edge increases as the amount of fluorine is raised. The optical energy gap E g is mainly determined by CF bond in the films, which results in the change of the density of states in band tail of the valence band.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2001年第10期2017-2022,共6页
Acta Physica Sinica
基金
江苏省自然科学基金 (批准号 :L310 870 3)~~
