摘要
随着微电子技术的发展,某些特殊器件如集成光栅的生产,需要进行圆弧图形的曝光。在Bresenham算法的基础上,提出了一种圆生成算法及填充策略。该方法通过设置决策函数和迭代增量,判断最接近圆函数曲线的象素点,从而得到和圆函数图形逼近较好的曲线图形。这种算法应用于以DSP芯片为基础的电子束曝光机图形发生器上,可以快速且较好地得出圆图形单元的各象素点,输出信号至D/A,通过信号转换控制偏转放大器绘制图形。此算法适于硬件完成,简化了数据处理过程,并提高了图形绘制速度和图形精度。
With the development of microelectronics technology, the realization of some specific devices such as integrated grating arrays requires the lithography of conic(circular)patterns.A circlecreating algorithm and filling strategy,which are applied to pattern generator of electron beam lithography system,are proposed on the basis of Bresenham Algorithm. The algorithm can estimate the pixels that are closest to the curve of conic function by setting determination function and iterative increment.The pattern generator can elicit all the relevant pixels of the circle primitive with fast rate. The key component of the pattern generator is DSP that generates signals to DACs and controls the deflector to generate the pattern primitives required to complete the fabrication. This algorithm not only fits the performance of the hardware such as DSP chips and simplifies the data processing but also improves the generation speed and precision of primitives as well.
出处
《微细加工技术》
2003年第2期6-11,共6页
Microfabrication Technology
