摘要
在锆合金基体上制备直流磁控溅射铬膜,研究了基体宏观粗糙度、膜层沉积前的离子轰击对膜/基附着性的影响,以探讨利用铬膜改善锆合金耐蚀性的可能性。实验中,使用扫描电镜(SEM)观察了界面形貌及Zr、Cr的界面分布,用划痕法测定了铬膜的附着性,结果表明:锆/铬界面结合良好,边界清晰,成分升降区依界面形貌不同而有差异;实验获得的铬膜附着性均超过20N;在本文条件下,机械锁紧力对附着性有重要影响;基体宏观粗糙度的增加对附着性无明显影响,但表面轻微粗化有利于膜的附着性;溅射前的基体离子轰击有利于提高铬膜与基体的附着力,但轰击时间过长并无意义。
The chromium thin films was deposited by D.C magnetron sputtering on the substrates of zirconium alloy and the adhesion of the chromium film to zirconium alloy substrate surface was studied. The substrates of samples (Ⅰ,Ⅱ,Ⅲ,Ⅳ) pretreated were respectively as follows: polished mechanically; unpolished; polished mechanically and argon ion bombardment for 10 min; polished mechanically and argon ion bombardment for 20 min. By SEM observation of the interface of Cr/Zr and scratch adhesion tests, its was found that interface of Cr/Zr is wellknit and there is a visible boundary; bond strengths of all samples are more than 20 N. It was concluded that the macro-roughness of substrate surface has few effect on the adhesion, and that roughening the substrate surface slightly is good for the adhesion.Ions bombardment prior to sputtering improves the adhesion, but it is useless if the bombarding time is too long; Difference of the samples adhesion comes from the microcosmic roughness of substrate surface and its mechanical clasping force.
出处
《四川大学学报（工程科学版）》
EI
CAS
CSCD
2003年第2期77-79,共3页
Journal of Sichuan University (Engineering Science Edition)
基金
武器装备预研基金资助项目(51481080101SC0101)
关键词
基体表面状态
直流磁控溅射
铬膜
锆合金
附着性
substrate surface appearance
D.C. magnetron sputtering
chromium films
zirconium alloy
adhesion
