摘要
本文介绍了直流磁控溅射淀积Si薄膜的镀膜工艺,研究了Si薄膜的光学特性(包括透射率光谱曲线、光学吸收、光学常数)和电阻率,通过对薄膜的X射线能谱图和透射衍射图等研究、观察,了解了磁控溅射Si薄膜的晶相结构,以及它们经加热处理后的变化情况,并加以讨论。
In this paper, the deposition process of Si films produced by DC magnetron sputtering was detailed. Optical properties, including in transmittance pectra, optical absorption and optical constants, and resistivities of films were studied. Bymeans of XRD, SEM and TED, the crystal structure of Si films was investigated. Mechanism of some change, that was caused by high temperature treatments in properties of Si films was discussed.
出处
《激光与红外》
CAS
CSCD
北大核心
1989年第5期52-55,共4页
Laser & Infrared
