摘要
在近年来迅速发展的微细加工技术中,表面膜层厚度的测量是十分重要的问题。本文提出一种新方法,它利用迈克耳逊干涉光路,通过对膜层前后两表面反射光束和来自另一臂的反射光束产生的两组白光干涉纹黑线间隔的测量,即可得到表面膜层的厚度、这种测量方法迅速、简便、设备简单、精确度高、不损伤膜层表面,适合在实验室和工厂广泛应用。
The measurement of thickness of surface film layer is quite impo-rtant for fine processing techniques developed rapidly in recent years. Inthis paper, a new method is presented, in which we measure the thickness ofsurface film layer by means of measuring the distance between correspondingtwo dark lines in two groups of white light interference fringes that are res-Pectively produced by two beam reflected by two surface of the thin filmlayer and another beam coming from another arm in Michelson interferome-ter. The measurement is rapid, simple, accurate, and does not damage thesurface. The method is suitable for widely applying to both laboratoriesand factories.
出处
《光电工程》
CAS
CSCD
1992年第5期48-51,共4页
Opto-Electronic Engineering
基金
国家自然科学基金资助项目
关键词
测量
干涉仪
膜厚
Thin film thickness measurement. Michelson interferometers,Equal thick interference fringes.
